Confinement of microplasma in silicon trenches with widths as small as 2.5 μm

In plasma science, the ability to confine plasma in cavities with characteristic dimensions less than 1 μm would represent a major milestone. In this thesis, realization of microplasma inside channel devices with the characteristic dimensions of 5 μm and 2.5 μm is discussed. Data collected during the characterization of 5 μm devices are consistent with Paschen’s curve. Operating devices with a characteristic dimension of 2.5 μm are also introduced in this thesis. Finally, a few potential strategies for creating “nanoplasma” devices are discussed.

Name thesis:degree_name

M.S.

Level thesis:degree_level

Thesis

Discipline thesis:degree_discipline

Electrical & Computer Engr

Grantor

University of Illinois at Urbana-Champaign

Year dc:date

2012

Author dc:creator

• Kim, Eung Soo

Contributors dc:contributor

• Eden, James G.

• microplasma
• nanoplasma
• Paschen's curve
• pd curve

Statement dc:rights

• Copyright 2012 Eung Soo Kim

Language dc:language

en

Handle dc:identifier

http://hdl.handle.net/2142/34514

OAI identifier oai:identifier

oai:www.ideals.illinois.edu:2142/34514