{"id":{"repo_id":"uiuc","oai_identifier":"oai:www.ideals.illinois.edu:2142/34514"},"canonical_url":"https://search.dev.ndltd.org/etd/uiuc/oai:www.ideals.illinois.edu:2142/34514","repository":{"repo_id":"uiuc","name":"University of Illinois - Urbana-Champaign","base_url":"https://www.ideals.illinois.edu/oai-pmh"},"display":{"title":"Confinement of microplasma in silicon trenches with widths as small as 2.5 μm","abstract":"In plasma science, the ability to confine plasma in cavities with characteristic dimensions less than 1 μm would represent a major milestone. In this thesis, realization of microplasma inside channel devices with the characteristic dimensions of 5 μm and 2.5 μm is discussed. Data collected during the characterization of 5 μm devices are consistent with Paschen’s curve. Operating devices with a characteristic dimension of 2.5 μm are also introduced in this thesis. Finally, a few potential strategies for creating “nanoplasma” devices are discussed.","abstract_html":"In plasma science, the ability to confine plasma in cavities with characteristic dimensions less than 1 μm would represent a major milestone. In this thesis, realization of microplasma inside channel devices with the characteristic dimensions of 5 μm and 2.5 μm is discussed. Data collected during the characterization of 5 μm devices are consistent with Paschen’s curve. Operating devices with a characteristic dimension of 2.5 μm are also introduced in this thesis. Finally, a few potential strategies for creating “nanoplasma” devices are discussed.","abstract_has_math":false,"creators":["Kim, Eung Soo"],"institution":"University of Illinois at Urbana-Champaign","degree_name":"M.S.","degree_level":"Thesis","degree_discipline":"Electrical & Computer Engr","degree_department":null,"school":null,"contributors":["Eden, James G."],"advisors":[],"committee_chairs":[],"committee_members":[],"year":2012,"date_issued":"2012-09-18T21:23:30Z","date_published":"2012-09-18T21:23:30Z","updated_at":"2026-07-22T22:25:31Z","subjects":["microplasma","nanoplasma","Paschen's curve","pd curve"],"languages":["en"],"rights":["Copyright 2012 Eung Soo Kim"],"rights_urls":[],"identifier_entries":[]},"links":{"outbound_url":"http://hdl.handle.net/2142/34514","outbound_label":"Handle","outbound_source":"dc:identifier"},"metadata_groups":[{"id":"people","label":"People","entries":[{"key":"dc:contributor","label":"Contributor","values":["Eden, James G."]},{"key":"dc:creator","label":"Author","values":["Kim, Eung Soo"]}]},{"id":"academic_context","label":"Academic Context","entries":[{"key":"dc:date","label":"Dc Date","values":["2012-09-18T21:23:30Z","2014-09-18T10:00:56Z","2012-08"]},{"key":"thesis:degree_discipline","label":"Discipline","values":["Electrical & Computer Engr"]},{"key":"thesis:degree_level","label":"Degree Level","values":["Thesis"]},{"key":"thesis:degree_name","label":"Degree Name","values":["M.S."]},{"key":"thesis:institution_name","label":"Thesis Institution Name","values":["University of Illinois at Urbana-Champaign"]}]},{"id":"subjects_keywords","label":"Subjects and Keywords","entries":[{"key":"dc:subject","label":"Dc Subject","values":["microplasma","nanoplasma","Paschen's curve","pd curve"]}]},{"id":"language_rights","label":"Language and Rights","entries":[{"key":"dc:language","label":"Dc Language","values":["en"]},{"key":"dc:rights","label":"Dc Rights","values":["Copyright 2012 Eung Soo Kim"]}]},{"id":"identifiers","label":"Identifiers","entries":[{"key":"dc:identifier","label":"Identifier","values":["http://hdl.handle.net/2142/34514"]}]},{"id":"additional","label":"Additional Metadata","entries":[{"key":"dc:description","label":"Description","values":["In plasma science, the ability to confine plasma in cavities with characteristic dimensions less than 1 μm would represent a major milestone. In this thesis, realization of microplasma inside channel devices with the characteristic dimensions of 5 μm and 2.5 μm is discussed. Data collected during the characterization of 5 μm devices are consistent with Paschen’s curve. Operating devices with a characteristic dimension of 2.5 μm are also introduced in this thesis. Finally, a few potential strategies for creating “nanoplasma” devices are discussed.","Item withdrawn by Mark Zulauf (zulauf@illinois.edu) on 2012-07-03T13:34:17Z Item was in collections: University of Illinois Theses & Dissertations (ID: 1) No. of bitstreams: 2 Kim_Eung Soo.docx: 3695449 bytes, checksum: f9b9f9d198b24c0df48db84e86b22a8b (MD5) Kim_Eung Soo.pdf: 1053742 bytes, checksum: a8fd09d2d644fa69abc4cd2624d0f250 (MD5)","Made available in DSpace on 2012-09-18T21:23:30Z (GMT). No. of bitstreams: 3 Kim_Eung Soo.pdf: 1053742 bytes, checksum: a8fd09d2d644fa69abc4cd2624d0f250 (MD5) license.txt: 4056 bytes, checksum: 4cc1a97ea68d3c502b2bcb5a59682f01 (MD5) Kim_Eung Soo.docx: 3695449 bytes, checksum: f9b9f9d198b24c0df48db84e86b22a8b (MD5)","Item marked as restricted to the 'Administrator' Group (id=1) by Seth Robbins (srobbins@illinois.edu) on 2012-09-18T21:27:16Z Item is restricted until 2014-09-18T21:27:16Z","Restriction data tranferred 2014-07-01T11:35:41-05:00 Original Data Group with Access Administrator Release Date: 2014-09-18 16:27:16 UTC Reason: Author requested closed access (OA after 2yrs) in Vireo ETD system","Limited Restriction Lifted for Item 34788 on 2014-09-18T10:00:55Z."]},{"key":"dc:title","label":"Title","values":["Confinement of microplasma in silicon trenches with widths as small as 2.5 μm"]}]}],"canonical_facts":{"dc:contributor":["Eden, James G."],"dc:creator":["Kim, Eung Soo"],"dc:date":["2012-09-18T21:23:30Z","2014-09-18T10:00:56Z","2012-08"],"dc:description":["In plasma science, the ability to confine plasma in cavities with characteristic dimensions less than 1 μm would represent a major milestone. In this thesis, realization of microplasma inside channel devices with the characteristic dimensions of 5 μm and 2.5 μm is discussed. Data collected during the characterization of 5 μm devices are consistent with Paschen’s curve. Operating devices with a characteristic dimension of 2.5 μm are also introduced in this thesis. Finally, a few potential strategies for creating “nanoplasma” devices are discussed.","Item withdrawn by Mark Zulauf (zulauf@illinois.edu) on 2012-07-03T13:34:17Z Item was in collections: University of Illinois Theses & Dissertations (ID: 1) No. of bitstreams: 2 Kim_Eung Soo.docx: 3695449 bytes, checksum: f9b9f9d198b24c0df48db84e86b22a8b (MD5) Kim_Eung Soo.pdf: 1053742 bytes, checksum: a8fd09d2d644fa69abc4cd2624d0f250 (MD5)","Made available in DSpace on 2012-09-18T21:23:30Z (GMT). No. of bitstreams: 3 Kim_Eung Soo.pdf: 1053742 bytes, checksum: a8fd09d2d644fa69abc4cd2624d0f250 (MD5) license.txt: 4056 bytes, checksum: 4cc1a97ea68d3c502b2bcb5a59682f01 (MD5) Kim_Eung Soo.docx: 3695449 bytes, checksum: f9b9f9d198b24c0df48db84e86b22a8b (MD5)","Item marked as restricted to the 'Administrator' Group (id=1) by Seth Robbins (srobbins@illinois.edu) on 2012-09-18T21:27:16Z Item is restricted until 2014-09-18T21:27:16Z","Restriction data tranferred 2014-07-01T11:35:41-05:00 Original Data Group with Access Administrator Release Date: 2014-09-18 16:27:16 UTC Reason: Author requested closed access (OA after 2yrs) in Vireo ETD system","Limited Restriction Lifted for Item 34788 on 2014-09-18T10:00:55Z."],"dc:identifier":["http://hdl.handle.net/2142/34514"],"dc:language":["en"],"dc:rights":["Copyright 2012 Eung Soo Kim"],"dc:subject":["microplasma","nanoplasma","Paschen's curve","pd curve"],"dc:title":["Confinement of microplasma in silicon trenches with widths as small as 2.5 μm"],"thesis:degree_discipline":["Electrical & Computer Engr"],"thesis:degree_level":["Thesis"],"thesis:degree_name":["M.S."],"thesis:institution_name":["University of Illinois at Urbana-Champaign"]},"updated_at":"2026-07-22T22:25:31Z"}