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University of Illinois - Urbana-Champaign
Degradation Studies of Ultrathin Silicon Oxide Under Electrical Stress Using a Scanning Tunneling Microscope
Abstract
dc:descriptionSubmitted by Jesse Garrison (jagarris@illinois.edu) on 2012-01-17T18:25:40Z No. of bitstreams: 1 1999_hetrick.pdf: 3179100 bytes, checksum: 1456c9f34957d5afe213413ca490bce8 (MD5)
Degree
thesis:*- Name thesis:degree_name
- Ph.D.
- Level thesis:degree_level
- Dissertation
- Discipline thesis:degree_discipline
- Physics
- Year dc:date
- 2012
Author and committee
dc:creator, dc:contributor.*- Author dc:creator
-
- Hetrick, James Michael
- Contributors dc:contributor
-
- Nayfeh, Munir H.
Subjects
dc:subject × 4Rights
dc:rights- Statement dc:rights
-
- © 1999 James Michael Hetrick
- Language dc:language
- en
Identifiers
dc:identifier.*- Identifier
- 4272869
- OAI identifier oai:identifier
- oai:www.ideals.illinois.edu:2142/28653