University of Illinois at Urbana-Champaign
Parallel algorithms for standard cell placement using simulated annealing
Abstract
dc:descriptionAs modern VLSI designs have become larger and more complicated, the computational requirements for design automation tools have also increased. As a result, the parallelization of these tools is of great importance. One of the more computationally intensive parts of the entire VLSI design process is the placement process. Simulated-annealing-based approaches have been the most popular and effective methods for cell placement. In this thesis, parallelization approaches to simulated-annealing-based standard cell placement are presented.
Degree
thesis:*- Name thesis:degree_name
- Ph.D.
- Level thesis:degree_level
- Dissertation
- Discipline thesis:degree_discipline
- Electrical Engineering
- Grantor
- University of Illinois at Urbana-Champaign
- Year dc:date
- 2011
Author and committee
dc:creator, dc:contributor.*- Author dc:creator
-
- Chandy, John A.
- Contributors dc:contributor
-
- Banerjee, Prithviraj
Subjects
dc:subject × 2Rights
dc:rights- Statement dc:rights
-
- Copyright 1996 Chandy, John Attupurathu
- Language dc:language
- eng
Identifiers
dc:identifier.*- Identifier
-
9780591197570
AAI9712216
(UMI)AAI9712216 - OAI identifier oai:identifier
- oai:www.ideals.illinois.edu:2142/21523