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University of Illinois at Urbana-Champaign
Plasma-enhanced chemical vapor deposition of hydrogenated silicon carbide films from novel precursors
Abstract
dc:descriptionMade available in DSpace on 2011-05-07T12:36:59Z (GMT). No. of bitstreams: 2 license.txt: 4922 bytes, checksum: 910b249b4beec47e7ab768910c8f966f (MD5) 9210972.pdf: 12369824 bytes, checksum: fd525d929ff7e6afc7ee9c5de5cd2d57 (MD5) Previous issue date: 1991
Degree
thesis:*- Name thesis:degree_name
- Ph.D.
- Level thesis:degree_level
- Dissertation
- Discipline thesis:degree_discipline
- Chemistry
- Grantor
- University of Illinois at Urbana-Champaign
- Year dc:date
- 2011
Author and committee
dc:creator, dc:contributor.*- Author dc:creator
-
- Rynders, Steven Walton
- Contributors dc:contributor
-
- Bohn, Paul W.
Subjects
dc:subject × 1Rights
dc:rights- Statement dc:rights
-
- Copyright 1991 Rynders, Steven Walton
- Language dc:language
- eng
Identifiers
dc:identifier.*- Identifier
-
AAI9210972
(UMI)AAI9210972 - OAI identifier oai:identifier
- oai:www.ideals.illinois.edu:2142/20360