Global ETD Search
Search theses and dissertations gathered from participating repositories worldwide. Every result links back to the library that holds it. No account is needed.
Results
Showing 1 to 20 of 110 for “"plasma-enhanced"”.
-
Polymeric nitrogen by plasma enhanced chemical vapor deposition
… describes the first detailed study of a plasma-enhanced chemical vapor deposition (PECVD) approach to the synthesis of polymeric nitrogen. PECVD provides non-equilibrium conditions known to produce high pressure-temperature phases. Molecular nitrogen mixed with hydrogen and argon is used …
-
Electrical characterization of plasma-enhanced Cvd silicon nitride dielectric on copper
… The LCI MIM uses copper as the bottom electrode, plasma enhanced silicon nitride as the dielectric, and Tantalum nitride as the top electrode. The target capacitance density is 1.5fF/mum2. The target leakage current is 1e-7A/cm2 at 3.3V at 125°C. The maximum operating voltages that the MIM is …
-
Synthesis and characterization of plasma enhanced chemically vapor deposited tantalum films
A low temperature inorganic plasma-enhanced chemical vapor deposition (PECVD) process has been developed for the growth of Ta using tantalum pentachloride (TaC15) as the preferred precursor and hydrogen as the reactant gas. Ta coatings were deposited at substrate temperature of 370-400 C, reactor …
-
Plasma-Enhanced Continuous Carbon Fibre-Reinforced Composites Manufactured from Recycled Thermoplastics
… functionalisation by atmospheric pressure plasma jet (APPJ) treatments with dry air working gas, then incorporate this understanding to enhance continuous CF-reinforced thermoplastic tape manufactured with novel techniques to facilitate the impregnation with hard-to-recycle waste polymer …
-
Plasma Enhanced Layer-by-layer Deposition and Nano-crystallization of Si:H films
… relatively easy to manufacture at low cost, by plasma enhanced chemical vapor deposition (PECVD), compared to single crystal Si. The crystalline volume fraction of nc-Si films needs to be well controlled to prevent light-induced degradation of the otherwise amorphous hydrogenated Si (a-Si:H). A …
-
Pulsed plasma enhanced and pyrolytic chemical vapor deposition of fluorocarbon biopassivation coatings
Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Chemical Engineering, 1997.
-
Low dielectric constant fluorocarbon films containing silicon by plasma enhanced chemical vapor deposition
… linewidth technology. The films were prepared by plasma enhanced chemical vapor deposition (PECVD) using gas precursors of tetrafluoromethane as the source of active species and disilane (5 % by volume in helium) as both an active species source and a reducing agent to control the ratio of …
-
Plasma-enhanced chemical vapor deposition of hydrogenated silicon carbide films from novel precursors
Made available in DSpace on 2011-05-07T12:36:59Z (GMT). No. of bitstreams: 2 license.txt: 4922 bytes, checksum: 910b249b4beec47e7ab768910c8f966f (MD5) 9210972.pdf: 12369824 bytes, checksum: fd525d929ff7e6afc7ee9c5de5cd2d57 (MD5) Previous issue date: 1991
-
Pulsed plasma enhanced chemical vapor deposition of fluorocarbon thin films for dielectric applications
Thesis (Ph.D.)--Massachusetts Institute of Technology, Dept. of Chemical Engineering, 1999.
-
Particle generation in a chemical vapor deposition/plasma-enhanced chemical vapor deposition interlayer dielectric tool
The interlayer dielectric plays an important role in multilevel integration. Material choice, processing, and contamination greatly impact the performance of the layer. In this study, particle generation, deposition, and adhesion mechanisms are reviewed. In particular, four important sources of …
-
On the Impact and Growth of Plasma-enhanced Atomic Layer Deposition High- Dielectrics on 2D Crystals
… for the field. </p><p>In this work, the use of plasma-enhanced atomic layer deposition (PEALD) was studied for its ability to enable the nucleation and growth of ultrathin, high-k dielectrics onto various 2D crystal surfaces. It was discovered that the PEALD process can provide significant …
-
Plasma-enhanced molecular layer deposition (PEMLD) of boron carbide dielectrics from carboranes for interconnect and patterning applications
… the development of a so far unprecedented plasma-enhanced molecular layer deposition (PEMLD) process for boron carbide from carboranes. This novel method will allow for the deposition of thin films of boron carbide with molecular-level control. Boron carbide, which lies outside the silicon …
-
Design and construction of a diagnostic suite for fundamental studies of pulsed plasma enhanced chemical vapor deposition
Includes bibliographical references (pages 65-68).
-
Radiation response and optical characterization of carbon based thin-films prepared by saddle field plasma enhanced chemical vapor deposition
… study, the direct current (DC) saddle field Plasma Enhanced Chemical Vapor Deposition (PECVD) method was used to prepare a set of nano-crystalline diamond samples. The relation between the deposition pressure, the gases mixing ratios and the resultant film characteristics were studied. The …
-
Fabrication and Characterization of Silicon Rich Oxide (SRO) Thin Film Deposited by Plasma Enhanced CVD for Si Quantum Dot
… rich oxide (SRO) deposition using Microwave-Plasma Enhanced Chemical Vapor Deposition (MW-PECVD), which has the potential of giving higher film quality for intrinsic Hydrogen involvement and less defects after chemical reactions. The electrical properties were not included in this thesis to …
-
Study of a low pressure arc discharge plasma enhanced nitriding reactor : application to steels, aluminium and titanium surfaces treatments
… dans le réacteur permettent de créer un plasma basse tension (20-40 V) à fort courant (100-300A) dans des mélanges gazeux Ar-N2 et Ar-N2-H2. Un diagnostic du plasma mène par spectroscopie d'émission optique, a permis de déterminer les mécanismes d'excitation. En particulier, des résultats …
-
Chemical vapor deposition of organosilicon composite thin films for porous low-k dielectrics
Pulsed plasma enhanced chemical vapor deposition has produced organosilicon thin films with the potential use as low dielectric constant interconnect materials in microelectronic circuits. Both diethylsilane and octamethylcyclotetrasiloxane precursors were used, with oxygen and hydrogen peroxides …
-
Optical Transitions in Amorphous Semiconductors
… formalism is applied to the specific case of plasma enhanced chemical vapor deposition deposited hydrogenated amorphous silicon, this being the most widely used amorphous semiconductor at present. It is found that the mobility gap value suggested by Jackson et al. [Physical Review B, vol. 31, …
Page 1 of 6