Application of layout and topology optimization using pattern gradation for the conceptual design of buildings

This work explores the use of manufacturing-type constraints, in particular pattern gradation and repetition, in the context of layout optimization. By placing constraints on the design domain in terms of number and size of repeating patterns along any direction, the conceptual design for buildings is facilitated. To substantiate the potential future applications of this work, examples within the context of high-rise building design are presented. Successful development of such ideas will lead to practical engineering solutions, especially during the building design process. Throughout this work, a continuous topology optimization formulation is utilized with compliance as the objective function and constraints on the pattern geometry. Examples are given to illustrate the ideas developed both in two-dimensional and three-dimensional building configurations.

Name thesis:degree_name

M.S.

Level thesis:degree_level

Thesis

Discipline thesis:degree_discipline

Civil Engineering

Grantor

University of Illinois at Urbana-Champaign

Year dc:date

2010

Author dc:creator

• Stromberg, Lauren L.

Contributors dc:contributor

• Paulino, Glaucio H.

• topology optmization
• pattern gradation
• material layout
• high-rise buildings
• pattern constraints

Statement dc:rights

• Copyright 2010 by Lauren Lynne Stromberg. All rights reserved.

Language dc:language

en

Handle dc:identifier

http://hdl.handle.net/2142/16004

OAI identifier oai:identifier

oai:www.ideals.illinois.edu:2142/16004