{"id":{"repo_id":"uiuc","oai_identifier":"oai:www.ideals.illinois.edu:2142/16004"},"canonical_url":"https://search.dev.ndltd.org/etd/uiuc/oai:www.ideals.illinois.edu:2142/16004","repository":{"repo_id":"uiuc","name":"University of Illinois - Urbana-Champaign","base_url":"https://www.ideals.illinois.edu/oai-pmh"},"display":{"title":"Application of layout and topology optimization using pattern gradation for the conceptual design of buildings","abstract":"This work explores the use of manufacturing-type constraints, in particular pattern gradation and repetition, in the context of layout optimization. By placing constraints on the design domain in terms of number and size of repeating patterns along any direction, the conceptual design for buildings is facilitated. To substantiate the potential future applications of this work, examples within the context of high-rise building design are presented. Successful development of such ideas will lead to practical engineering solutions, especially during the building design process. Throughout this work, a continuous topology optimization formulation is utilized with compliance as the objective function and constraints on the pattern geometry. Examples are given to illustrate the ideas developed both in two-dimensional and three-dimensional building configurations.","abstract_html":"This work explores the use of manufacturing-type constraints, in particular pattern gradation and repetition, in the context of layout optimization. By placing constraints on the design domain in terms of number and size of repeating patterns along any direction, the conceptual design for buildings is facilitated. To substantiate the potential future applications of this work, examples within the context of high-rise building design are presented. Successful development of such ideas will lead to practical engineering solutions, especially during the building design process. Throughout this work, a continuous topology optimization formulation is utilized with compliance as the objective function and constraints on the pattern geometry. Examples are given to illustrate the ideas developed both in two-dimensional and three-dimensional building configurations.","abstract_has_math":false,"creators":["Stromberg, Lauren L."],"institution":"University of Illinois at Urbana-Champaign","degree_name":"M.S.","degree_level":"Thesis","degree_discipline":"Civil Engineering","degree_department":null,"school":null,"contributors":["Paulino, Glaucio H."],"advisors":[],"committee_chairs":[],"committee_members":[],"year":2010,"date_issued":"2010-05-18T18:55:53Z","date_published":"2010-05-18T18:55:53Z","updated_at":"2026-07-22T22:25:08Z","subjects":["topology optmization","pattern gradation","material layout","high-rise buildings","pattern constraints"],"languages":["en"],"rights":["Copyright 2010 by Lauren Lynne Stromberg. All rights reserved."],"rights_urls":[],"identifier_entries":[]},"links":{"outbound_url":"http://hdl.handle.net/2142/16004","outbound_label":"Handle","outbound_source":"dc:identifier"},"metadata_groups":[{"id":"people","label":"People","entries":[{"key":"dc:contributor","label":"Contributor","values":["Paulino, Glaucio H."]},{"key":"dc:creator","label":"Author","values":["Stromberg, Lauren L."]}]},{"id":"academic_context","label":"Academic Context","entries":[{"key":"dc:date","label":"Dc Date","values":["2010-05-18T18:55:53Z","2012-05-19T10:00:17Z","2010-5"]},{"key":"thesis:degree_discipline","label":"Discipline","values":["Civil Engineering"]},{"key":"thesis:degree_level","label":"Degree Level","values":["Thesis"]},{"key":"thesis:degree_name","label":"Degree Name","values":["M.S."]},{"key":"thesis:institution_name","label":"Thesis Institution Name","values":["University of Illinois at Urbana-Champaign"]}]},{"id":"subjects_keywords","label":"Subjects and Keywords","entries":[{"key":"dc:subject","label":"Dc Subject","values":["topology optmization","pattern gradation","material layout","high-rise buildings","pattern constraints"]}]},{"id":"language_rights","label":"Language and Rights","entries":[{"key":"dc:language","label":"Dc Language","values":["en"]},{"key":"dc:rights","label":"Dc Rights","values":["Copyright 2010 by Lauren Lynne Stromberg. All rights reserved."]}]},{"id":"identifiers","label":"Identifiers","entries":[{"key":"dc:identifier","label":"Identifier","values":["http://hdl.handle.net/2142/16004"]}]},{"id":"additional","label":"Additional Metadata","entries":[{"key":"dc:description","label":"Description","values":["This work explores the use of manufacturing-type constraints, in particular pattern gradation and repetition, in the context of layout optimization. By placing constraints on the design domain in terms of number and size of repeating patterns along any direction, the conceptual design for buildings is facilitated. To substantiate the potential future applications of this work, examples within the context of high-rise building design are presented. Successful development of such ideas will lead to practical engineering solutions, especially during the building design process. Throughout this work, a continuous topology optimization formulation is utilized with compliance as the objective function and constraints on the pattern geometry. Examples are given to illustrate the ideas developed both in two-dimensional and three-dimensional building configurations.","Item withdrawn by Mark Zulauf (zulauf@illinois.edu) on 2010-04-02T12:35:13Z Item was in collections: University of Illinois Theses & Dissertations (ID: 1) No. of bitstreams: 2 Stromberg_Lauren.pdf: 9140727 bytes, checksum: b9560cc03614ae6af6520e547d3614c8 (MD5) mythesis.tex: 91559 bytes, checksum: 19b4924d7897934ec4aa69d53dd810c5 (MD5)","Made available in DSpace on 2010-05-18T18:55:53Z (GMT). No. of bitstreams: 4 Stromberg_Lauren.pdf: 9140727 bytes, checksum: b9560cc03614ae6af6520e547d3614c8 (MD5) 1_Stromberg_Lauren.pdf: 9140750 bytes, checksum: 24c1ceee20c8ac297cccd0bf29c146d6 (MD5) mythesis.tex: 91559 bytes, checksum: 19b4924d7897934ec4aa69d53dd810c5 (MD5) license.txt: 4066 bytes, checksum: 4e3e071a7a86afb4d52b47f1604eb718 (MD5)","Item marked as restricted to the 'Administrator' Group (id=1) by William Ingram (wingram2@illinois.edu) on 2010-05-18T18:56:43Z Item is restricted until 2012-05-18T18:56:42Z","Item reinstated by Sarah Shreeves (sshreeve@illinois.edu) on 2012-05-19T10:00:17Z Item was in collections: Dissertations and Theses - Civil and Environmental Engineering (ID: 672) University of Illinois Dissertations and Theses (ID: 204) No. of bitstreams: 5 1_Stromberg_Lauren.pdf.txt: 99543 bytes, checksum: e6aba78386c8425cd0a2546097f471c1 (MD5) Stromberg_Lauren.pdf: 9140727 bytes, checksum: b9560cc03614ae6af6520e547d3614c8 (MD5) 1_Stromberg_Lauren.pdf: 9140750 bytes, checksum: 24c1ceee20c8ac297cccd0bf29c146d6 (MD5) mythesis.tex: 91559 bytes, checksum: 19b4924d7897934ec4aa69d53dd810c5 (MD5) license.txt: 4066 bytes, checksum: 4e3e071a7a86afb4d52b47f1604eb718 (MD5)","Item released from any restrictions by Sarah Shreeves (sshreeve@illinois.edu) on 2012-05-19T10:00:17Z"]},{"key":"dc:title","label":"Title","values":["Application of layout and topology optimization using pattern gradation for the conceptual design of buildings"]}]}],"canonical_facts":{"dc:contributor":["Paulino, Glaucio H."],"dc:creator":["Stromberg, Lauren L."],"dc:date":["2010-05-18T18:55:53Z","2012-05-19T10:00:17Z","2010-5"],"dc:description":["This work explores the use of manufacturing-type constraints, in particular pattern gradation and repetition, in the context of layout optimization. By placing constraints on the design domain in terms of number and size of repeating patterns along any direction, the conceptual design for buildings is facilitated. To substantiate the potential future applications of this work, examples within the context of high-rise building design are presented. Successful development of such ideas will lead to practical engineering solutions, especially during the building design process. Throughout this work, a continuous topology optimization formulation is utilized with compliance as the objective function and constraints on the pattern geometry. Examples are given to illustrate the ideas developed both in two-dimensional and three-dimensional building configurations.","Item withdrawn by Mark Zulauf (zulauf@illinois.edu) on 2010-04-02T12:35:13Z Item was in collections: University of Illinois Theses & Dissertations (ID: 1) No. of bitstreams: 2 Stromberg_Lauren.pdf: 9140727 bytes, checksum: b9560cc03614ae6af6520e547d3614c8 (MD5) mythesis.tex: 91559 bytes, checksum: 19b4924d7897934ec4aa69d53dd810c5 (MD5)","Made available in DSpace on 2010-05-18T18:55:53Z (GMT). No. of bitstreams: 4 Stromberg_Lauren.pdf: 9140727 bytes, checksum: b9560cc03614ae6af6520e547d3614c8 (MD5) 1_Stromberg_Lauren.pdf: 9140750 bytes, checksum: 24c1ceee20c8ac297cccd0bf29c146d6 (MD5) mythesis.tex: 91559 bytes, checksum: 19b4924d7897934ec4aa69d53dd810c5 (MD5) license.txt: 4066 bytes, checksum: 4e3e071a7a86afb4d52b47f1604eb718 (MD5)","Item marked as restricted to the 'Administrator' Group (id=1) by William Ingram (wingram2@illinois.edu) on 2010-05-18T18:56:43Z Item is restricted until 2012-05-18T18:56:42Z","Item reinstated by Sarah Shreeves (sshreeve@illinois.edu) on 2012-05-19T10:00:17Z Item was in collections: Dissertations and Theses - Civil and Environmental Engineering (ID: 672) University of Illinois Dissertations and Theses (ID: 204) No. of bitstreams: 5 1_Stromberg_Lauren.pdf.txt: 99543 bytes, checksum: e6aba78386c8425cd0a2546097f471c1 (MD5) Stromberg_Lauren.pdf: 9140727 bytes, checksum: b9560cc03614ae6af6520e547d3614c8 (MD5) 1_Stromberg_Lauren.pdf: 9140750 bytes, checksum: 24c1ceee20c8ac297cccd0bf29c146d6 (MD5) mythesis.tex: 91559 bytes, checksum: 19b4924d7897934ec4aa69d53dd810c5 (MD5) license.txt: 4066 bytes, checksum: 4e3e071a7a86afb4d52b47f1604eb718 (MD5)","Item released from any restrictions by Sarah Shreeves (sshreeve@illinois.edu) on 2012-05-19T10:00:17Z"],"dc:identifier":["http://hdl.handle.net/2142/16004"],"dc:language":["en"],"dc:rights":["Copyright 2010 by Lauren Lynne Stromberg. All rights reserved."],"dc:subject":["topology optmization","pattern gradation","material layout","high-rise buildings","pattern constraints"],"dc:title":["Application of layout and topology optimization using pattern gradation for the conceptual design of buildings"],"thesis:degree_discipline":["Civil Engineering"],"thesis:degree_level":["Thesis"],"thesis:degree_name":["M.S."],"thesis:institution_name":["University of Illinois at Urbana-Champaign"]},"updated_at":"2026-07-22T22:25:08Z"}