Process development and fabrication of photonic crystal based III-V semiconductor optical sources

Semiconductor laser diodes play a vital role in modern technology- in such applications as facial recognition and high-speed data transmission for which efficient operation in single mode emission is desired. Vertical Cavity Surface Emitting Laser (VCSEL) diodes are at the forefront for these applications and there has been significant development in VCSEL technology over the years. It is essential to maintain the single mode properties of VCSELs while also increasing power and efficiency. Photonic Crystal Surface Emitting Lasers (PCSELs) are promising sources for single mode high power and high brightness applications. The aim of this thesis is to develop fabrication techniques for advanced VCSEL and PCSEL device manufacture. The photolithography, hard mask etches, and III-V etch processes have been used and modified to attain more controllability over the PhC definition and dimensions. Moreover, for high power and mode control of the light emitted, InP based PCSEL process development and fabrication was done. A high index contrast structure was designed, and a material science test was carried out to see the feasibility of the structure.

Name thesis:degree_name

M.S.

Level thesis:degree_level

Thesis

Discipline thesis:degree_discipline

Electrical & Computer Engr

Grantor

University of Illinois at Urbana-Champaign

Year dc:date

2023

Author dc:creator

• Pandey, Sanat

Contributors dc:contributor

• Choquette, Kent D

• Photonic crystal, VCSEL, PCSEL

Statement dc:rights

• Copyright 2023 Sanat Pandey

Language dc:language

en

Handle dc:identifier

https://hdl.handle.net/2142/120462

OAI identifier oai:identifier

oai:www.ideals.illinois.edu:2142/120462