{"id":{"repo_id":"uiuc","oai_identifier":"oai:www.ideals.illinois.edu:2142/120462"},"canonical_url":"https://search.dev.ndltd.org/etd/uiuc/oai:www.ideals.illinois.edu:2142/120462","repository":{"repo_id":"uiuc","name":"University of Illinois - Urbana-Champaign","base_url":"https://www.ideals.illinois.edu/oai-pmh"},"display":{"title":"Process development and fabrication of photonic crystal based III-V semiconductor optical sources","abstract":"Semiconductor laser diodes play a vital role in modern technology- in such applications as facial recognition and high-speed data transmission for which efficient operation in single mode emission is desired. Vertical Cavity Surface Emitting Laser (VCSEL) diodes are at the forefront for these applications and there has been significant development in VCSEL technology over the years. It is essential to maintain the single mode properties of VCSELs while also increasing power and efficiency. Photonic Crystal Surface Emitting Lasers (PCSELs) are promising sources for single mode high power and high brightness applications. The aim of this thesis is to develop fabrication techniques for advanced VCSEL and PCSEL device manufacture. The photolithography, hard mask etches, and III-V etch processes have been used and modified to attain more controllability over the PhC definition and dimensions. Moreover, for high power and mode control of the light emitted, InP based PCSEL process development and fabrication was done. A high index contrast structure was designed, and a material science test was carried out to see the feasibility of the structure.","abstract_html":"Semiconductor laser diodes play a vital role in modern technology- in such applications as facial recognition and high-speed data transmission for which efficient operation in single mode emission is desired. Vertical Cavity Surface Emitting Laser (VCSEL) diodes are at the forefront for these applications and there has been significant development in VCSEL technology over the years. It is essential to maintain the single mode properties of VCSELs while also increasing power and efficiency. Photonic Crystal Surface Emitting Lasers (PCSELs) are promising sources for single mode high power and high brightness applications. The aim of this thesis is to develop fabrication techniques for advanced VCSEL and PCSEL device manufacture. The photolithography, hard mask etches, and III-V etch processes have been used and modified to attain more controllability over the PhC definition and dimensions. Moreover, for high power and mode control of the light emitted, InP based PCSEL process development and fabrication was done. A high index contrast structure was designed, and a material science test was carried out to see the feasibility of the structure.","abstract_has_math":false,"creators":["Pandey, Sanat"],"institution":"University of Illinois at Urbana-Champaign","degree_name":"M.S.","degree_level":"Thesis","degree_discipline":"Electrical & Computer Engr","degree_department":null,"school":null,"contributors":["Choquette, Kent D"],"advisors":[],"committee_chairs":[],"committee_members":[],"year":2023,"date_issued":"2023-05","date_published":"2023-05","updated_at":"2026-07-22T22:24:57Z","subjects":["Photonic crystal, VCSEL, PCSEL"],"languages":["en"],"rights":["Copyright 2023 Sanat Pandey"],"rights_urls":[],"identifier_entries":[]},"links":{"outbound_url":"https://hdl.handle.net/2142/120462","outbound_label":"Handle","outbound_source":"dc:identifier"},"metadata_groups":[{"id":"people","label":"People","entries":[{"key":"dc:contributor","label":"Contributor","values":["Choquette, Kent D"]},{"key":"dc:creator","label":"Author","values":["Pandey, Sanat"]}]},{"id":"academic_context","label":"Academic Context","entries":[{"key":"dc:date","label":"Dc Date","values":["2023-05","2023-05-05"]},{"key":"dc:type","label":"Dc Type","values":["text","Thesis"]},{"key":"thesis:degree_discipline","label":"Discipline","values":["Electrical & Computer Engr"]},{"key":"thesis:degree_level","label":"Degree Level","values":["Thesis"]},{"key":"thesis:degree_name","label":"Degree Name","values":["M.S."]},{"key":"thesis:institution_name","label":"Thesis Institution Name","values":["University of Illinois at Urbana-Champaign"]}]},{"id":"subjects_keywords","label":"Subjects and Keywords","entries":[{"key":"dc:subject","label":"Dc Subject","values":["Photonic crystal, VCSEL, PCSEL"]}]},{"id":"language_rights","label":"Language and Rights","entries":[{"key":"dc:language","label":"Dc Language","values":["en"]},{"key":"dc:rights","label":"Dc Rights","values":["Copyright 2023 Sanat Pandey"]}]},{"id":"identifiers","label":"Identifiers","entries":[{"key":"dc:identifier","label":"Identifier","values":["https://hdl.handle.net/2142/120462"]}]},{"id":"additional","label":"Additional Metadata","entries":[{"key":"dc:description","label":"Description","values":["Semiconductor laser diodes play a vital role in modern technology- in such applications as facial recognition and high-speed data transmission for which efficient operation in single mode emission is desired. Vertical Cavity Surface Emitting Laser (VCSEL) diodes are at the forefront for these applications and there has been significant development in VCSEL technology over the years. It is essential to maintain the single mode properties of VCSELs while also increasing power and efficiency. Photonic Crystal Surface Emitting Lasers (PCSELs) are promising sources for single mode high power and high brightness applications. The aim of this thesis is to develop fabrication techniques for advanced VCSEL and PCSEL device manufacture. The photolithography, hard mask etches, and III-V etch processes have been used and modified to attain more controllability over the PhC definition and dimensions. Moreover, for high power and mode control of the light emitted, InP based PCSEL process development and fabrication was done. A high index contrast structure was designed, and a material science test was carried out to see the feasibility of the structure.","Submission published under a 24 month embargo labeled 'U of I Access', the embargo will last until 2025-05-01","The student, Sanat Pandey, accepted the attached license on 2023-05-03 at 18:27.","The student, Sanat Pandey, submitted this Thesis for approval on 2023-05-03 at 18:36.","This Thesis was approved for publication on 2023-05-05 at 10:37.","DSpace SAF Submission Ingestion Package generated from Vireo submission #19328 on 2023-09-01 at 17:16:03"]},{"key":"dc:format","label":"Dc Format","values":["application/pdf"]},{"key":"dc:title","label":"Title","values":["Process development and fabrication of photonic crystal based III-V semiconductor optical sources"]}]}],"canonical_facts":{"dc:contributor":["Choquette, Kent D"],"dc:creator":["Pandey, Sanat"],"dc:date":["2023-05","2023-05-05"],"dc:description":["Semiconductor laser diodes play a vital role in modern technology- in such applications as facial recognition and high-speed data transmission for which efficient operation in single mode emission is desired. Vertical Cavity Surface Emitting Laser (VCSEL) diodes are at the forefront for these applications and there has been significant development in VCSEL technology over the years. It is essential to maintain the single mode properties of VCSELs while also increasing power and efficiency. Photonic Crystal Surface Emitting Lasers (PCSELs) are promising sources for single mode high power and high brightness applications. The aim of this thesis is to develop fabrication techniques for advanced VCSEL and PCSEL device manufacture. The photolithography, hard mask etches, and III-V etch processes have been used and modified to attain more controllability over the PhC definition and dimensions. Moreover, for high power and mode control of the light emitted, InP based PCSEL process development and fabrication was done. A high index contrast structure was designed, and a material science test was carried out to see the feasibility of the structure.","Submission published under a 24 month embargo labeled 'U of I Access', the embargo will last until 2025-05-01","The student, Sanat Pandey, accepted the attached license on 2023-05-03 at 18:27.","The student, Sanat Pandey, submitted this Thesis for approval on 2023-05-03 at 18:36.","This Thesis was approved for publication on 2023-05-05 at 10:37.","DSpace SAF Submission Ingestion Package generated from Vireo submission #19328 on 2023-09-01 at 17:16:03"],"dc:format":["application/pdf"],"dc:identifier":["https://hdl.handle.net/2142/120462"],"dc:language":["en"],"dc:rights":["Copyright 2023 Sanat Pandey"],"dc:subject":["Photonic crystal, VCSEL, PCSEL"],"dc:title":["Process development and fabrication of photonic crystal based III-V semiconductor optical sources"],"dc:type":["text","Thesis"],"thesis:degree_discipline":["Electrical & Computer Engr"],"thesis:degree_level":["Thesis"],"thesis:degree_name":["M.S."],"thesis:institution_name":["University of Illinois at Urbana-Champaign"]},"updated_at":"2026-07-22T22:24:57Z"}