Subsurface two-photon lithography: improvements and applications

Two-photon lithography has previously been used to fabricate a variety of three-dimensional structures where the material is uniform throughout. When performing subsurface controllable refractive index via beam exposure (SCRIBE), two-photon lithography is implemented with a porous material as the writing medium, allowing different densities of photoresist to be created within. Thus, with SCRIBE, a variety of gradient index (GRIN) optical devices can be fabricated. In this work, we explore the challenges with applying SCRIBE-written optics as tools in standard planar photolithography. We propose and explore several solutions to these challenges via new calibration and correction procedures. Furthermore, we demonstrate the advantages of our new calibration procedure on practical devices, including diffraction gratings. Finally, we share improvements on SCRIBE-written waveguide insertion loss and preliminary data on possible applications. Overall, we detail both improvements to the fundamental process of SCRIBE and a variety of applications that are uniquely well-suited to SCRIBE.

Name thesis:degree_name

M.S.

Level thesis:degree_level

Thesis

Discipline thesis:degree_discipline

Electrical & Computer Engr

Grantor

University of Illinois at Urbana-Champaign

Year dc:date

2023

Author dc:creator

• Littlefield, Alexander James

Contributors dc:contributor

• Goddard, Lynford L.
• Braun, Paul V.

• two-photon lithography
• direct laser writing
• gradient index
• mathematical methods
• waveguide coupling

Statement dc:rights

• Copyright 2021 Alexander Littlefield

Language dc:language

en

Handle dc:identifier

https://hdl.handle.net/2142/117886

OAI identifier oai:identifier

oai:www.ideals.illinois.edu:2142/117886