{"id":{"repo_id":"uiuc","oai_identifier":"oai:www.ideals.illinois.edu:2142/117886"},"canonical_url":"https://search.dev.ndltd.org/etd/uiuc/oai:www.ideals.illinois.edu:2142/117886","repository":{"repo_id":"uiuc","name":"University of Illinois - Urbana-Champaign","base_url":"https://www.ideals.illinois.edu/oai-pmh"},"display":{"title":"Subsurface two-photon lithography: improvements and applications","abstract":"Two-photon lithography has previously been used to fabricate a variety of three-dimensional structures where the material is uniform throughout. When performing subsurface controllable refractive index via beam exposure (SCRIBE), two-photon lithography is implemented with a porous material as the writing medium, allowing different densities of photoresist to be created within. Thus, with SCRIBE, a variety of gradient index (GRIN) optical devices can be fabricated. In this work, we explore the challenges with applying SCRIBE-written optics as tools in standard planar photolithography. We propose and explore several solutions to these challenges via new calibration and correction procedures. Furthermore, we demonstrate the advantages of our new calibration procedure on practical devices, including diffraction gratings. Finally, we share improvements on SCRIBE-written waveguide insertion loss and preliminary data on possible applications. Overall, we detail both improvements to the fundamental process of SCRIBE and a variety of applications that are uniquely well-suited to SCRIBE.","abstract_html":"Two-photon lithography has previously been used to fabricate a variety of three-dimensional structures where the material is uniform throughout. When performing subsurface controllable refractive index via beam exposure (SCRIBE), two-photon lithography is implemented with a porous material as the writing medium, allowing different densities of photoresist to be created within. Thus, with SCRIBE, a variety of gradient index (GRIN) optical devices can be fabricated. In this work, we explore the challenges with applying SCRIBE-written optics as tools in standard planar photolithography. We propose and explore several solutions to these challenges via new calibration and correction procedures. Furthermore, we demonstrate the advantages of our new calibration procedure on practical devices, including diffraction gratings. Finally, we share improvements on SCRIBE-written waveguide insertion loss and preliminary data on possible applications. Overall, we detail both improvements to the fundamental process of SCRIBE and a variety of applications that are uniquely well-suited to SCRIBE.","abstract_has_math":false,"creators":["Littlefield, Alexander James"],"institution":"University of Illinois at Urbana-Champaign","degree_name":"M.S.","degree_level":"Thesis","degree_discipline":"Electrical & Computer Engr","degree_department":null,"school":null,"contributors":["Goddard, Lynford L.","Braun, Paul V."],"advisors":[],"committee_chairs":[],"committee_members":[],"year":2023,"date_issued":"2023-05-12T21:04:01-05:00","date_published":"2023-05-12T21:04:01-05:00","updated_at":"2026-07-22T22:24:56Z","subjects":["two-photon lithography","direct laser writing","gradient index","mathematical methods","waveguide coupling"],"languages":["en"],"rights":["Copyright 2021 Alexander Littlefield"],"rights_urls":[],"identifier_entries":[]},"links":{"outbound_url":"https://hdl.handle.net/2142/117886","outbound_label":"Handle","outbound_source":"dc:identifier"},"metadata_groups":[{"id":"people","label":"People","entries":[{"key":"dc:contributor","label":"Contributor","values":["Goddard, Lynford L.","Braun, Paul V."]},{"key":"dc:creator","label":"Author","values":["Littlefield, Alexander James"]}]},{"id":"academic_context","label":"Academic Context","entries":[{"key":"dc:date","label":"Dc Date","values":["2023-05-12T21:04:01-05:00","2021-12-09","2021-12"]},{"key":"dc:relation","label":"Dc Relation","values":["Errata for “Subsurface two-photon lithography: Improvements and applications” by Alexander James Littlefield https://hdl.handle.net/2142/120072"]},{"key":"dc:type","label":"Dc Type","values":["text","Thesis"]},{"key":"thesis:degree_discipline","label":"Discipline","values":["Electrical & Computer Engr"]},{"key":"thesis:degree_level","label":"Degree Level","values":["Thesis"]},{"key":"thesis:degree_name","label":"Degree Name","values":["M.S."]},{"key":"thesis:institution_name","label":"Thesis Institution Name","values":["University of Illinois at Urbana-Champaign"]}]},{"id":"subjects_keywords","label":"Subjects and Keywords","entries":[{"key":"dc:subject","label":"Dc Subject","values":["two-photon lithography","direct laser writing","gradient index","mathematical methods","waveguide coupling"]}]},{"id":"language_rights","label":"Language and Rights","entries":[{"key":"dc:language","label":"Dc Language","values":["en"]},{"key":"dc:rights","label":"Dc Rights","values":["Copyright 2021 Alexander Littlefield"]}]},{"id":"identifiers","label":"Identifiers","entries":[{"key":"dc:identifier","label":"Identifier","values":["https://hdl.handle.net/2142/117886"]}]},{"id":"additional","label":"Additional Metadata","entries":[{"key":"dc:description","label":"Description","values":["Two-photon lithography has previously been used to fabricate a variety of three-dimensional structures where the material is uniform throughout. When performing subsurface controllable refractive index via beam exposure (SCRIBE), two-photon lithography is implemented with a porous material as the writing medium, allowing different densities of photoresist to be created within. Thus, with SCRIBE, a variety of gradient index (GRIN) optical devices can be fabricated. In this work, we explore the challenges with applying SCRIBE-written optics as tools in standard planar photolithography. We propose and explore several solutions to these challenges via new calibration and correction procedures. Furthermore, we demonstrate the advantages of our new calibration procedure on practical devices, including diffraction gratings. Finally, we share improvements on SCRIBE-written waveguide insertion loss and preliminary data on possible applications. Overall, we detail both improvements to the fundamental process of SCRIBE and a variety of applications that are uniquely well-suited to SCRIBE."]},{"key":"dc:format","label":"Dc Format","values":["application/pdf"]},{"key":"dc:title","label":"Title","values":["Subsurface two-photon lithography: improvements and applications"]}]}],"canonical_facts":{"dc:contributor":["Goddard, Lynford L.","Braun, Paul V."],"dc:creator":["Littlefield, Alexander James"],"dc:date":["2023-05-12T21:04:01-05:00","2021-12-09","2021-12"],"dc:description":["Two-photon lithography has previously been used to fabricate a variety of three-dimensional structures where the material is uniform throughout. When performing subsurface controllable refractive index via beam exposure (SCRIBE), two-photon lithography is implemented with a porous material as the writing medium, allowing different densities of photoresist to be created within. Thus, with SCRIBE, a variety of gradient index (GRIN) optical devices can be fabricated. In this work, we explore the challenges with applying SCRIBE-written optics as tools in standard planar photolithography. We propose and explore several solutions to these challenges via new calibration and correction procedures. Furthermore, we demonstrate the advantages of our new calibration procedure on practical devices, including diffraction gratings. Finally, we share improvements on SCRIBE-written waveguide insertion loss and preliminary data on possible applications. Overall, we detail both improvements to the fundamental process of SCRIBE and a variety of applications that are uniquely well-suited to SCRIBE."],"dc:format":["application/pdf"],"dc:identifier":["https://hdl.handle.net/2142/117886"],"dc:language":["en"],"dc:relation":["Errata for “Subsurface two-photon lithography: Improvements and applications” by Alexander James Littlefield https://hdl.handle.net/2142/120072"],"dc:rights":["Copyright 2021 Alexander Littlefield"],"dc:subject":["two-photon lithography","direct laser writing","gradient index","mathematical methods","waveguide coupling"],"dc:title":["Subsurface two-photon lithography: improvements and applications"],"dc:type":["text","Thesis"],"thesis:degree_discipline":["Electrical & Computer Engr"],"thesis:degree_level":["Thesis"],"thesis:degree_name":["M.S."],"thesis:institution_name":["University of Illinois at Urbana-Champaign"]},"updated_at":"2026-07-22T22:24:56Z"}