Conduction mechanisms in thin atomic layer deposited films containing TiO2

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University of Tartu

dc:creator Jõgi, Indrek

dc:date.issued2007

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Identifier: hdl:10062/3590
OAI record oai:identifier: http://dspace.ut.ee/oai/request?verb=GetRecord&metadataPrefix=dim&identifier=oai%3Adspace.ut.ee%3A10062%2F3590

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Jõgi, Indrek. Conduction mechanisms in thin atomic layer deposited films containing TiO2. 2007. http://hdl.handle.net/10062/3590