{"id":{"repo_id":"tartu","oai_identifier":"oai:dspace.ut.ee:10062/3590"},"canonical_url":"https://search.dev.ndltd.org/etd/tartu/oai:dspace.ut.ee:10062/3590","repository":{"repo_id":"tartu","name":"University of Tartu","base_url":"http://dspace.ut.ee/oai/request"},"display":{"title":"Conduction mechanisms in thin atomic layer deposited films containing TiO2","abstract":"","abstract_html":null,"abstract_has_math":false,"creators":["Jõgi, Indrek"],"institution":null,"degree_name":null,"degree_level":null,"degree_discipline":null,"degree_department":null,"school":null,"contributors":[],"advisors":[],"committee_chairs":[],"committee_members":[],"year":2007,"date_issued":"2007-09-14T06:06:39Z","date_published":"2007-09-14T06:06:39Z","updated_at":"2026-07-24T06:23:29Z","subjects":[],"languages":[],"rights":[],"rights_urls":[],"identifier_entries":[{"key":"dc:identifier","label":"Identifier","values":["hdl:10062/3590"],"render_values":[{"text":"hdl:10062/3590","href":null,"code":true}]}]},"links":{"outbound_url":null,"outbound_label":null,"outbound_source":null},"metadata_groups":[{"id":"academic_context","label":"Academic Context","entries":[{"key":"dc:date.issued","label":"Date","values":["2007-09-14T06:06:39Z"]},{"key":"dc:type","label":"Dc Type","values":["Thesis"]}]},{"id":"identifiers","label":"Identifiers","entries":[{"key":"dc:identifier","label":"Identifier","values":["hdl:10062/3590"]}]},{"id":"additional","label":"Additional Metadata","entries":[{"key":"dc:title","label":"Title","values":["Conduction mechanisms in thin atomic layer deposited films containing TiO2"]}]}],"canonical_facts":{"dc:date.issued":["2007-09-14T06:06:39Z"],"dc:identifier":["hdl:10062/3590"],"dc:title":["Conduction mechanisms in thin atomic layer deposited films containing TiO2"],"dc:type":["Thesis"]},"updated_at":"2026-07-24T06:23:29Z"}