Abstract
dc:description.abstractRecently, atomic layer deposition (ALD) has been employed as a promising technique for the growth of solid thin films with high conformality on complex geometries such as heterogeneous catalysts and microelectronic devices. In this work, surface sensitive characterization techniques have been employed to investigate initial precursor-substrate reactions and ALD surface chemistry.
Degree
thesis:*- Name thesis:degree_name
- Doctor of Philosophy (PhD)
- Level thesis:degree_level
- Dissertation
- Discipline thesis:degree_discipline
- Chemical Engineering
- Year
- 2014
Author and committee
dc:creator, dc:contributor.*- Author dc:creator
-
- Gharachorlou, Amir
- Contributors dc:contributor
-
- Fabio Ribeiro
- Michael Harris
- Nicholas Delgass
- Dmitry Zemlyanov
Subjects
dc:subject × 6Identifiers
dc:identifier.*- Repository record dc:identifier
- https://docs.lib.purdue.edu/open_access_dissertations/1077
- OAI identifier oai:identifier
- oai:docs.lib.purdue.edu:open_access_dissertations-2293