{"id":{"repo_id":"purdue-thes","oai_identifier":"oai:docs.lib.purdue.edu:open_access_dissertations-2293"},"canonical_url":"https://search.dev.ndltd.org/etd/purdue-thes/oai:docs.lib.purdue.edu:open_access_dissertations-2293","repository":{"repo_id":"purdue-thes","name":"Purdue University","base_url":"https://docs.lib.purdue.edu/do/oai/"},"display":{"title":"SURFACE SCIENCE APPROACH TO ATOMIC LAYER DEPOSITION CHEMISTRY","abstract":"Recently, atomic layer deposition (ALD) has been employed as a promising technique for the growth of solid thin films with high conformality on complex geometries such as heterogeneous catalysts and microelectronic devices. In this work, surface sensitive characterization techniques have been employed to investigate initial precursor-substrate reactions and ALD surface chemistry.","abstract_html":"Recently, atomic layer deposition (ALD) has been employed as a promising technique for the growth of solid thin films with high conformality on complex geometries such as heterogeneous catalysts and microelectronic devices. In this work, surface sensitive characterization techniques have been employed to investigate initial precursor-substrate reactions and ALD surface chemistry.","abstract_has_math":false,"creators":["Gharachorlou, Amir"],"institution":null,"degree_name":"Doctor of Philosophy (PhD)","degree_level":"Dissertation","degree_discipline":"Chemical Engineering","degree_department":null,"school":null,"contributors":["Fabio Ribeiro","Michael Harris","Nicholas Delgass","Dmitry Zemlyanov"],"advisors":[],"committee_chairs":[],"committee_members":[],"year":2014,"date_issued":"2014-01-01T08:00:00Z","date_published":"2014-01-01T08:00:00Z","updated_at":"2026-07-24T03:54:17Z","subjects":["ALD","catalyst","HREELS","STM","surface scinece","XPS"],"languages":[],"rights":[],"rights_urls":[],"identifier_entries":[]},"links":{"outbound_url":"https://docs.lib.purdue.edu/open_access_dissertations/1077","outbound_label":"Repository record","outbound_source":"dc:identifier"},"metadata_groups":[{"id":"people","label":"People","entries":[{"key":"dc:contributor","label":"Contributor","values":["Fabio Ribeiro","Michael Harris","Nicholas Delgass","Dmitry Zemlyanov"]},{"key":"dc:creator","label":"Author","values":["Gharachorlou, Amir"]}]},{"id":"academic_context","label":"Academic Context","entries":[{"key":"thesis:degree_discipline","label":"Discipline","values":["Chemical Engineering"]},{"key":"thesis:degree_level","label":"Degree Level","values":["Dissertation"]},{"key":"thesis:degree_name","label":"Degree Name","values":["Doctor of Philosophy (PhD)"]}]},{"id":"subjects_keywords","label":"Subjects and Keywords","entries":[{"key":"dc:subject","label":"Dc Subject","values":["ALD","catalyst","HREELS","STM","surface scinece","XPS"]}]},{"id":"identifiers","label":"Identifiers","entries":[{"key":"dc:identifier","label":"Identifier","values":["https://docs.lib.purdue.edu/open_access_dissertations/1077"]}]},{"id":"additional","label":"Additional Metadata","entries":[{"key":"dc:description.abstract","label":"Abstract","values":["Recently, atomic layer deposition (ALD) has been employed as a promising technique for the growth of solid thin films with high conformality on complex geometries such as heterogeneous catalysts and microelectronic devices. In this work, surface sensitive characterization techniques have been employed to investigate initial precursor-substrate reactions and ALD surface chemistry."]},{"key":"dc:title","label":"Title","values":["SURFACE SCIENCE APPROACH TO ATOMIC LAYER DEPOSITION CHEMISTRY"]}]}],"canonical_facts":{"dc:contributor":["Fabio Ribeiro","Michael Harris","Nicholas Delgass","Dmitry Zemlyanov"],"dc:creator":["Gharachorlou, Amir"],"dc:description.abstract":["Recently, atomic layer deposition (ALD) has been employed as a promising technique for the growth of solid thin films with high conformality on complex geometries such as heterogeneous catalysts and microelectronic devices. In this work, surface sensitive characterization techniques have been employed to investigate initial precursor-substrate reactions and ALD surface chemistry."],"dc:identifier":["https://docs.lib.purdue.edu/open_access_dissertations/1077"],"dc:subject":["ALD","catalyst","HREELS","STM","surface scinece","XPS"],"dc:title":["SURFACE SCIENCE APPROACH TO ATOMIC LAYER DEPOSITION CHEMISTRY"],"thesis:degree_discipline":["Chemical Engineering"],"thesis:degree_level":["Dissertation"],"thesis:degree_name":["Doctor of Philosophy (PhD)"]},"updated_at":"2026-07-24T03:54:17Z"}