Migration from electronics to photonics in multicore processor

Twenty - first opportunities for Gigascale Integration will be governed in part by a hierarchy of physical limits on interconnect. Microprocessor performance is now limited by the poor delay and bandwidth performance of the on - chip global wiring layer. This thesis is envisioned as a critical showstopper of electronic industry in the near future. The physical reason behind the interconnect bottleneck is the resistive nature of metals. The introduction of copper in place of aluminum has temporarily improved the interconnect performance, but a more disruptive solution will be required in order to keep the current pace of progress, optical interconnect is an intriguing alternative to metallic wires. Many - core microprocessors will push performance per chip from the 10 gigaflop to the 10 teraflop range in the coming decade. Pin limitations, the energy cost of electrical signaling, and the non - scalability of chip - length global wires are significant bandwidth impediments. Silicon nanophotonic based many core architecture are introduced in order to meet the bandwidth requirements at acceptable power levels.

Department dc:contributor.department

Massachusetts Institute of Technology. Dept. of Materials Science and Engineering.

Grantor dc:publisher

Massachusetts Institute of Technology

Year dc:date.issued

2008

Author dc:creator

• Xu, Zhoujia

Advisor dc:contributor.advisor

• Lionel C. Kimerling.

• Materials Science and Engineering.

Statement dc:rights

• M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission.

Licence dc:rights.uri

• http://dspace.mit.edu/handle/1721.1/7582

Language dc:language.iso

eng

Handle dc:identifier.uri

http://hdl.handle.net/1721.1/45394

OAI identifier oai:identifier

oai:dspace.mit.edu:1721.1/45394