{"id":{"repo_id":"mit","oai_identifier":"oai:dspace.mit.edu:1721.1/45394"},"canonical_url":"https://search.dev.ndltd.org/etd/mit/oai:dspace.mit.edu:1721.1/45394","repository":{"repo_id":"mit","name":"MIT","base_url":"https://dspace.mit.edu/oai/request"},"display":{"title":"Migration from electronics to photonics in multicore processor","abstract":"Twenty - first opportunities for Gigascale Integration will be governed in part by a hierarchy of physical limits on interconnect. Microprocessor performance is now limited by the poor delay and bandwidth performance of the on - chip global wiring layer. This thesis is envisioned as a critical showstopper of electronic industry in the near future. The physical reason behind the interconnect bottleneck is the resistive nature of metals. The introduction of copper in place of aluminum has temporarily improved the interconnect performance, but a more disruptive solution will be required in order to keep the current pace of progress, optical interconnect is an intriguing alternative to metallic wires. Many - core microprocessors will push performance per chip from the 10 gigaflop to the 10 teraflop range in the coming decade. Pin limitations, the energy cost of electrical signaling, and the non - scalability of chip - length global wires are significant bandwidth impediments. Silicon nanophotonic based many core architecture are introduced in order to meet the bandwidth requirements at acceptable power levels.","abstract_html":"Twenty - first opportunities for Gigascale Integration will be governed in part by a hierarchy of physical limits on interconnect. Microprocessor performance is now limited by the poor delay and bandwidth performance of the on - chip global wiring layer. This thesis is envisioned as a critical showstopper of electronic industry in the near future. The physical reason behind the interconnect bottleneck is the resistive nature of metals. The introduction of copper in place of aluminum has temporarily improved the interconnect performance, but a more disruptive solution will be required in order to keep the current pace of progress, optical interconnect is an intriguing alternative to metallic wires. Many - core microprocessors will push performance per chip from the 10 gigaflop to the 10 teraflop range in the coming decade. Pin limitations, the energy cost of electrical signaling, and the non - scalability of chip - length global wires are significant bandwidth impediments. Silicon nanophotonic based many core architecture are introduced in order to meet the bandwidth requirements at acceptable power levels.","abstract_has_math":false,"creators":["Xu, Zhoujia"],"institution":"Massachusetts Institute of Technology","degree_name":null,"degree_level":null,"degree_discipline":null,"degree_department":"Massachusetts Institute of Technology. Dept. of Materials Science and Engineering.","school":null,"contributors":[],"advisors":["Lionel C. Kimerling."],"committee_chairs":[],"committee_members":[],"year":2008,"date_issued":"2008","date_published":"2008","updated_at":"2026-07-22T22:21:18Z","subjects":["Materials Science and Engineering."],"languages":["eng"],"rights":["M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission."],"rights_urls":["http://dspace.mit.edu/handle/1721.1/7582"],"identifier_entries":[]},"links":{"outbound_url":"http://hdl.handle.net/1721.1/45394","outbound_label":"Handle","outbound_source":"dc:identifier.uri"},"metadata_groups":[{"id":"people","label":"People","entries":[{"key":"dc:contributor.advisor","label":"Advisor","values":["Lionel C. Kimerling."]},{"key":"dc:contributor.department","label":"Department","values":["Massachusetts Institute of Technology. Dept. of Materials Science and Engineering."]},{"key":"dc:contributor.other","label":"Dc Contributor Other","values":["Massachusetts Institute of Technology. Dept. of Materials Science and Engineering."]},{"key":"dc:creator","label":"Author","values":["Xu, Zhoujia"]}]},{"id":"academic_context","label":"Academic Context","entries":[{"key":"dc:date.accessioned","label":"Dc Date Accessioned","values":["2009-04-29T17:35:17Z"]},{"key":"dc:date.available","label":"Dc Date Available","values":["2009-04-29T17:35:17Z"]},{"key":"dc:date.issued","label":"Date","values":["2008"]},{"key":"dc:publisher","label":"Institution","values":["Massachusetts Institute of Technology"]},{"key":"dc:type","label":"Dc Type","values":["Thesis"]}]},{"id":"subjects_keywords","label":"Subjects and Keywords","entries":[{"key":"dc:subject","label":"Dc Subject","values":["Materials Science and Engineering."]}]},{"id":"language_rights","label":"Language and Rights","entries":[{"key":"dc:language.iso","label":"Language (ISO)","values":["eng"]},{"key":"dc:rights","label":"Dc Rights","values":["M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission."]},{"key":"dc:rights.uri","label":"Rights URI","values":["http://dspace.mit.edu/handle/1721.1/7582"]}]},{"id":"identifiers","label":"Identifiers","entries":[{"key":"dc:identifier.uri","label":"Identifier URI","values":["http://hdl.handle.net/1721.1/45394"]}]},{"id":"additional","label":"Additional Metadata","entries":[{"key":"dc:description","label":"Description","values":["Thesis (M. Eng.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 2008.","Includes bibliographical references (leaf 54)."]},{"key":"dc:description.abstract","label":"Abstract","values":["Twenty - first opportunities for Gigascale Integration will be governed in part by a hierarchy of physical limits on interconnect. Microprocessor performance is now limited by the poor delay and bandwidth performance of the on - chip global wiring layer. This thesis is envisioned as a critical showstopper of electronic industry in the near future. The physical reason behind the interconnect bottleneck is the resistive nature of metals. The introduction of copper in place of aluminum has temporarily improved the interconnect performance, but a more disruptive solution will be required in order to keep the current pace of progress, optical interconnect is an intriguing alternative to metallic wires. Many - core microprocessors will push performance per chip from the 10 gigaflop to the 10 teraflop range in the coming decade. Pin limitations, the energy cost of electrical signaling, and the non - scalability of chip - length global wires are significant bandwidth impediments. Silicon nanophotonic based many core architecture are introduced in order to meet the bandwidth requirements at acceptable power levels."]},{"key":"dc:description.degree","label":"Dc Description Degree","values":["M.Eng."]},{"key":"dc:title","label":"Title","values":["Migration from electronics to photonics in multicore processor"]}]}],"canonical_facts":{"dc:contributor.advisor":["Lionel C. Kimerling."],"dc:contributor.department":["Massachusetts Institute of Technology. Dept. of Materials Science and Engineering."],"dc:contributor.other":["Massachusetts Institute of Technology. Dept. of Materials Science and Engineering."],"dc:creator":["Xu, Zhoujia"],"dc:date.accessioned":["2009-04-29T17:35:17Z"],"dc:date.available":["2009-04-29T17:35:17Z"],"dc:date.issued":["2008"],"dc:description":["Thesis (M. Eng.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 2008.","Includes bibliographical references (leaf 54)."],"dc:description.abstract":["Twenty - first opportunities for Gigascale Integration will be governed in part by a hierarchy of physical limits on interconnect. Microprocessor performance is now limited by the poor delay and bandwidth performance of the on - chip global wiring layer. This thesis is envisioned as a critical showstopper of electronic industry in the near future. The physical reason behind the interconnect bottleneck is the resistive nature of metals. The introduction of copper in place of aluminum has temporarily improved the interconnect performance, but a more disruptive solution will be required in order to keep the current pace of progress, optical interconnect is an intriguing alternative to metallic wires. Many - core microprocessors will push performance per chip from the 10 gigaflop to the 10 teraflop range in the coming decade. Pin limitations, the energy cost of electrical signaling, and the non - scalability of chip - length global wires are significant bandwidth impediments. Silicon nanophotonic based many core architecture are introduced in order to meet the bandwidth requirements at acceptable power levels."],"dc:description.degree":["M.Eng."],"dc:identifier.uri":["http://hdl.handle.net/1721.1/45394"],"dc:language.iso":["eng"],"dc:publisher":["Massachusetts Institute of Technology"],"dc:rights":["M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission."],"dc:rights.uri":["http://dspace.mit.edu/handle/1721.1/7582"],"dc:subject":["Materials Science and Engineering."],"dc:title":["Migration from electronics to photonics in multicore processor"],"dc:type":["Thesis"]},"updated_at":"2026-07-22T22:21:18Z"}