Advantages and challenges of plasma enhanced atomic layer deposition

Musschoot, Jan

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Ghent University. Faculty of Sciences

Advantages and challenges of plasma enhanced atomic layer deposition

dc:creator Musschoot, Jan

dc:date2011

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Grantor dc:publisher: Ghent University. Faculty of Sciences
Year dc:date: 2011

Author and committee

dc:creator, dc:contributor.*

Author dc:creator: Musschoot, Jan
Contributors dc:contributor: Detavernier, Christophe

Subjects

dc:subject × 13

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Statement dc:rights: info:eu-repo/semantics/openAccess
Language dc:language: eng

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Identifier: https://biblio.ugent.be/publication/1860582
https://biblio.ugent.be/publication/1860582/file/4335615
OAI record oai:identifier: https://biblio.ugent.be/oai?verb=GetRecord&metadataPrefix=oai_dc&identifier=oai%3Aarchive.ugent.be%3A1860582

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Harvested from: Ghent University
Base URL: biblio.ugent.be/oai
Last updated: 2026-07-24
Source record: OAI-PMH GetRecord

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Musschoot, Jan. Advantages and challenges of plasma enhanced atomic layer deposition. Ghent University. Faculty of Sciences, 2011. http://hdl.handle.net/1854/LU-1860582

Advantages and challenges of plasma enhanced atomic layer deposition

Degree

Author and committee

Subjects

Rights

Identifiers

Chain of custody

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