Advantages and challenges of plasma enhanced atomic layer deposition
type: CreativeWork
author: Musschoot, Jan
language: eng
keywords: Science General, modeling, nonwoven, conformality, titanium nitride, ruthenium, zinc oxide, vanadium pentoxide, titanium dioxide, plasma enhanced atomic layer deposition, plasma, atomic layer deposition, thin films
date published: 2011
date modified: 2026-07-24T02:23:00Z
provider: Ghent University
publisher: Networked Digital Library of Theses and Dissertations
type: WebPage
source organization: Ghent University. Faculty of Sciences

PropertyValue
property ID: Handle
value: http://hdl.handle.net/1854/LU-1860582