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Showing 1 to 20 of 147 for “"Ellipsometry"”.

  1. Mueller matrix spectroscopic ellipsometry of multiferroics

    … data. Initially, Mueller matrix spectroscopic ellipsometry is reviewed. Analysis for optical spectra measured for isotropic Dy_3Fe_5O_{12} is given, for which contributions from magnetic and electric excitations are identified and the absence of strong magneto-electric effects is explained. In …

    njit Repository record for Mueller matrix spectroscopic ellipsometry of multiferroics (opens in a new tab)

  2. Characterization of Ferroelectric Films by Spectroscopic Ellipsometry

    … modeling technique. Variable angle spectroscopic ellipsometry (VASE) models were developed by sequentially testing Bruggeman effective-media approximation (EMA) layers designed to simulate microstructural effects such as surface roughness, porosity, secondary phases, and substrate interaction. …

    vt Repository record for Characterization of Ferroelectric Films by Spectroscopic Ellipsometry (opens in a new tab)

  3. Ultrafast dynamic ellipsometry of laser driven shock waves

    … measurement technique of ultrafast dynamic ellipsometry (UDE) was developed for measuring material motion and changes in optical properties of samples under laser driven shock loading. Ultrafast dynamic ellipsometry, a technique based on space-shifted spectral interferometry, uses the …

    mit Repository record for Ultrafast dynamic ellipsometry of laser driven shock waves (opens in a new tab)

  4. Optical study of InP related semiconductor alloys;spectroscopic ellipsometry

    In this thesis, spectroscopic ellipsometry is used to study the effects of disorder, self-ordering, strain, and dopants on electronic band structure of InxGal-xP grown on GaAs, InxGa1_xP grown on GaP substrate with composition-graded InGaP buffer layer and lattice matched (AlxGa1_x)o.sino.sP grown …

    uiuc Repository record for Optical study of InP related semiconductor alloys;spectroscopic ellipsometry (opens in a new tab)

  5. Piloting epitaxy with ellipsometry as an in-situ sensor technology

    … attempts before success is realized. Ellipsometry is an established optical characterization method that uses the polarization state of reflected light to determine the alloy composition of a grown film. As a non-invasive sensor technology, ellipsometry has more recently been deployed …

    mit Repository record for Piloting epitaxy with ellipsometry as an in-situ sensor technology (opens in a new tab)

  6. Developing spectroscopic ellipsometry to study II-VI and diluted magnetic semiconductors

    We have constructed a rotating analyzer spectroscopic ellipsometer (RAE) to study effects of magnetic and nonmagnetic doping on the £1 and £1 + .11 band gap energies in ZnSe-based II-VI semiconductors. To remove the natural surface oxide overlayer which distorts the intrinsic dielectric response of …

    uiuc Repository record for Developing spectroscopic ellipsometry to study II-VI and diluted magnetic semiconductors (opens in a new tab)

  7. Spectroscopic ellipsometry and dielectric modeling of thin film CdTe/CdS photovoltaic devices

    Spectroscopic ellipsometry (SE) is a non-contact, non-destructive characterization technique for probing the optical properties of thin films. With the advent of second-generation solar cells, SE has seen use as a method for determining the dielectric function of each layer in heterostructured, …

    uiuc Repository record for Spectroscopic ellipsometry and dielectric modeling of thin film CdTe/CdS photovoltaic devices (opens in a new tab)

  8. System Design, Noise Reduction, and Improved Dimension Reconstruction for High Performance Ellipsometry

    … with high-throughput manufacturing needs. Ellipsometry gains popularity due to its advantages of non-invasiveness, high speed, and high resolution. The technology is an important metrology and inspection tool in many industries. Ellipsometry is a major tool in new material characterization, …

    mit Repository record for System Design, Noise Reduction, and Improved Dimension Reconstruction for High Performance Ellipsometry (opens in a new tab)

  9. In situ spectroscopic ellipsometry studies of silicon film crystallinity and interface structure deposited by DC reactive magnetron sputtering

    … a systematic series of in situ spectroscopic ellipsometry (SE) studies on silicon film growth by reactive magnetron sputtering of a Si target in (Ar + H$\sb2$) at low temperatures ($\le$600$\sp\circ$C). The complete crystalline film growth zones have been identified for the first time.

    uiuc Repository record for In situ spectroscopic ellipsometry studies of silicon film crystallinity and interface structure deposited by DC reactive magnetron sputtering (opens in a new tab)

  10. Investigation of growth kinetics of self-assembling monolayers by means of contact angle, optical ellipsometry, angle-resolved XPS and IR spectroscopy.

    … been studied by means of contact angle, optical ellipsometry, angle-resolved XPS (ARXPS), and with grazing angle total reflection FTIR. Growth of the monolayers from dilute solutions has been monitored and Langmuir isotherm adsorption curves were fitted to experimental data. A saturated film is …

    unt Repository record for Investigation of growth kinetics of self-assembling monolayers by means of contact angle, optical ellipsometry, angle-resolved XPS and IR spectroscopy. (opens in a new tab)

  11. Spectroscopic Ellipsometry Studies of Thin Film a-Si:H Solar Cell Fabrication by Multichamber Deposition in the n-i-p Substrate Configuration

    Real time spectroscopic ellipsometry (RTSE), and ex-situ mapping spectroscopic ellipsometry (SE) are powerful characterization techniques capable of performance optimization and scale-up evaluation of thin film solar cells used in various photovoltaics technologies. These non-invasive optical …

    ohiolink Repository record for Spectroscopic Ellipsometry Studies of Thin Film a-Si:H Solar Cell Fabrication by Multichamber Deposition in the n-i-p Substrate Configuration (opens in a new tab)

  12. Feasibility of Ellipsometric Sensor Development for Use During PECVD SiOx Coated Polymer Product Manufacturing

    … in an effort to determine the feasibility of an ellipsometry based measurement system for NS3’s purpose. Due to its extensive use in the semiconductor industry for monitoring films deposited on silicon, a measurement systems known as ellipsometry, adept at monitoring the thickness and refractive …

    calpoly Repository record for Feasibility of Ellipsometric Sensor Development for Use During PECVD SiOx Coated Polymer Product Manufacturing (opens in a new tab)

  13. Optical and thermal characteristics of thin polymer and polhedral oligomeric silsesquioxane (POSS) filled polymer films

    Single wavelength ellipsometry measurements at Brewster's angle provide a powerful technique for characterizing ultrathin polymeric films. By conducting the experiments in different ambient media, multiple incident media (MIM) ellipsometry, simultaneous determinations of a film's thickness and …

    vt Repository record for Optical and thermal characteristics of thin polymer and polhedral oligomeric silsesquioxane (POSS) filled polymer films (opens in a new tab)

  14. Synthesis of polyionic tetraazaporphyrins and their Langmuir-Blodgett properties.

    … films were characterized by their isotherms, ellipsometry and Brewster angle microscopy whereas the transferred Langmuir Blodgett films were characterized by linear polarized UV/VIS spectroscopy or ellipsometry. The length of the aliphatic spacer and the pH of the subphase were found to be …

    windsor Repository record for Synthesis of polyionic tetraazaporphyrins and their Langmuir-Blodgett properties. (opens in a new tab)

  15. Microreflectance and ellipsometric studies on the polished surfaces of some minerals

    … are assessed using microscope photometry and ellipsometry. Results from both methods are compared and any discrepancies in the data are Interpreted within the experimental and instrumental constraints of the two techniques. The errors involved in the calculation of reflectance and the optical …

    london-metro Repository record for Microreflectance and ellipsometric studies on the polished surfaces of some minerals (opens in a new tab)

  16. Elastomeric Stamping: Design Considerations for Long -Term Maintenance of Neuronal Networks

    … The thickness of each film was measured using ellipsometry and atomic force microscopy (AFM), from which the surface concentrations and grafting density were calculated. Fourier transform infrared spectroscopy was used to examine the structure and organization of the organosilane surfaces. …

    uiuc Repository record for Elastomeric Stamping: Design Considerations for Long -Term Maintenance of Neuronal Networks (opens in a new tab)

  17. The construction of an ellipsometer to measure the refractive index and thickness of thin films.

    … Chapter 2 develops the fundamental equation of ellipsometry from the problem of reflection and refraction of light at a boundary between two homogeneous, isotropic media, and reflection from a film-covered surface. The construction and choice of components for the ellipsometer is outlined in …

    rgu Repository record for The construction of an ellipsometer to measure the refractive index and thickness of thin films. (opens in a new tab)

  18. Trace Gas-Induced Brine and Disordered Interfacial Layers on Ice

    … 256 K using (i) the surface-specific technique ellipsometry and (ii) a coated wall flow tube (CWFT) reactor, both coupled with chemical ionization mass spectrometry (CIMS) detection of HNO_3 in the gas phase. Our ellipsometry results show that exposure to HNO_3 induces surface disordering on ice …

    columbia-diss Repository record for Trace Gas-Induced Brine and Disordered Interfacial Layers on Ice (opens in a new tab)

  19. How water meets a hydrophobic surface: reluctantly and with fluctuations

    … techniques, time-resolved phase-modulated ellipsometry, surface plasmon resonance, and X-ray reflectivity. Both ellipsometry and X-ray reflectivity provide strong evidence for the low-density layer and illuminate unexpected temporal behavior. Using all three techniques, we found surprising …

    uiuc Repository record for How water meets a hydrophobic surface: reluctantly and with fluctuations (opens in a new tab)

  20. Quasi-Elastic Light Scattering Diagnostics for a High Voltage Spark Discharge

    … scattering instrument was characterized using ellipsometry and Mueller calculus. Mie scattering theory was used in the determination of particle size in an aluminum cathode model system.

    uiuc Repository record for Quasi-Elastic Light Scattering Diagnostics for a High Voltage Spark Discharge (opens in a new tab)

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