Nonlinear microscopy for material characterization

Making use of femtosecond laser sources, nonlinear microscopy exhibits inherent 3- dimensional optical sectioning and provides access to previously unstudied aspects of materials. By probing third order nonlinear optical signals determined by the nonlinear susceptibility (chi-3), which is present in all materials, we gain insight not available by conventional linear or electron microscopy. Third-harmonic generation (THG) and four-wave mixing (FWM) microscopy are used to investigate fundamental material parameters. THG microscopy is applied to supplement damage studies of optical coatings by imaging laser induced material modification both above and below damage threshold conditions in HfO2 thin-films. FWM microscopy is employed to investigate FWM signals and implied finite response times in multiple substrates.

Name thesis:degree_name

Optical Science and Engineering

Level thesis:degree_level

Masters

Discipline thesis:degree_discipline

Optical Science and Engineering

Year

2010

Author dc:creator

• Weber, Reed Alan

Language dc:language

English

Identifier

https://digitalrepository.unm.edu/ose_etds/46

OAI identifier oai:identifier

oai:digitalrepository.unm.edu:ose_etds-1045