{"id":{"repo_id":"unm","oai_identifier":"oai:digitalrepository.unm.edu:ose_etds-1045"},"canonical_url":"https://search.dev.ndltd.org/etd/unm/oai:digitalrepository.unm.edu:ose_etds-1045","repository":{"repo_id":"unm","name":"University of New Mexico","base_url":"https://digitalrepository.unm.edu/do/oai/"},"display":{"title":"Nonlinear microscopy for material characterization","abstract":"Making use of femtosecond laser sources, nonlinear microscopy exhibits inherent 3- dimensional optical sectioning and provides access to previously unstudied aspects of materials. By probing third order nonlinear optical signals determined by the nonlinear susceptibility (chi-3), which is present in all materials, we gain insight not available by conventional linear or electron microscopy. Third-harmonic generation (THG) and four-wave mixing (FWM) microscopy are used to investigate fundamental material parameters. THG microscopy is applied to supplement damage studies of optical coatings by imaging laser induced material modification both above and below damage threshold conditions in HfO2 thin-films. FWM microscopy is employed to investigate FWM signals and implied finite response times in multiple substrates.","abstract_html":"Making use of femtosecond laser sources, nonlinear microscopy exhibits inherent 3- dimensional optical sectioning and provides access to previously unstudied aspects of materials. By probing third order nonlinear optical signals determined by the nonlinear susceptibility (chi-3), which is present in all materials, we gain insight not available by conventional linear or electron microscopy. Third-harmonic generation (THG) and four-wave mixing (FWM) microscopy are used to investigate fundamental material parameters. THG microscopy is applied to supplement damage studies of optical coatings by imaging laser induced material modification both above and below damage threshold conditions in HfO2 thin-films. FWM microscopy is employed to investigate FWM signals and implied finite response times in multiple substrates.","abstract_has_math":false,"creators":["Weber, Reed Alan"],"institution":null,"degree_name":"Optical Science and Engineering","degree_level":"Masters","degree_discipline":"Optical Science and Engineering","degree_department":null,"school":null,"contributors":[],"advisors":[],"committee_chairs":[],"committee_members":[],"year":2010,"date_issued":"2010-02-09T08:00:00Z","date_published":"2010-02-09T08:00:00Z","updated_at":"2026-07-24T05:26:35Z","subjects":[],"languages":["English"],"rights":[],"rights_urls":[],"identifier_entries":[{"key":"dc:identifier","label":"Identifier","values":["https://digitalrepository.unm.edu/ose_etds/46"],"render_values":[{"text":"https://digitalrepository.unm.edu/ose_etds/46","href":"https://digitalrepository.unm.edu/ose_etds/46","code":true}]}]},"links":{"outbound_url":"http://hdl.handle.net/1928/10312","outbound_label":"Handle","outbound_source":"dc:identifier"},"metadata_groups":[{"id":"people","label":"People","entries":[{"key":"dc:creator","label":"Author","values":["Weber, Reed Alan"]}]},{"id":"academic_context","label":"Academic Context","entries":[{"key":"thesis:degree_discipline","label":"Discipline","values":["Optical Science and Engineering"]},{"key":"thesis:degree_level","label":"Degree Level","values":["Masters","Thesis"]},{"key":"thesis:degree_name","label":"Degree Name","values":["Optical Science and Engineering"]}]},{"id":"language_rights","label":"Language and Rights","entries":[{"key":"dc:language","label":"Dc Language","values":["English"]}]},{"id":"identifiers","label":"Identifiers","entries":[{"key":"dc:identifier","label":"Identifier","values":["http://hdl.handle.net/1928/10312","https://digitalrepository.unm.edu/ose_etds/46"]}]},{"id":"additional","label":"Additional Metadata","entries":[{"key":"dc:description.abstract","label":"Abstract","values":["Making use of femtosecond laser sources, nonlinear microscopy exhibits inherent 3- dimensional optical sectioning and provides access to previously unstudied aspects of materials. By probing third order nonlinear optical signals determined by the nonlinear susceptibility (chi-3), which is present in all materials, we gain insight not available by conventional linear or electron microscopy. Third-harmonic generation (THG) and four-wave mixing (FWM) microscopy are used to investigate fundamental material parameters. THG microscopy is applied to supplement damage studies of optical coatings by imaging laser induced material modification both above and below damage threshold conditions in HfO2 thin-films. FWM microscopy is employed to investigate FWM signals and implied finite response times in multiple substrates."]},{"key":"dc:title","label":"Title","values":["Nonlinear microscopy for material characterization"]}]}],"canonical_facts":{"dc:creator":["Weber, Reed Alan"],"dc:description.abstract":["Making use of femtosecond laser sources, nonlinear microscopy exhibits inherent 3- dimensional optical sectioning and provides access to previously unstudied aspects of materials. By probing third order nonlinear optical signals determined by the nonlinear susceptibility (chi-3), which is present in all materials, we gain insight not available by conventional linear or electron microscopy. Third-harmonic generation (THG) and four-wave mixing (FWM) microscopy are used to investigate fundamental material parameters. THG microscopy is applied to supplement damage studies of optical coatings by imaging laser induced material modification both above and below damage threshold conditions in HfO2 thin-films. FWM microscopy is employed to investigate FWM signals and implied finite response times in multiple substrates."],"dc:identifier":["http://hdl.handle.net/1928/10312","https://digitalrepository.unm.edu/ose_etds/46"],"dc:language":["English"],"dc:title":["Nonlinear microscopy for material characterization"],"thesis:degree_discipline":["Optical Science and Engineering"],"thesis:degree_level":["Masters","Thesis"],"thesis:degree_name":["Optical Science and Engineering"]},"updated_at":"2026-07-24T05:26:35Z"}