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University of Illinois - Urbana-Champaign
Measurements and Modeling of Ti and TiN Sputtering
Abstract
dc:descriptionMade available in DSpace on 2017-07-06T18:56:01Z (GMT). No. of bitstreams: 3 Ranjan_Rajiv_MS.pdf: 1112075 bytes, checksum: 5abfc46cfff7d7a266b45252b6ac766b (MD5) Ranjan_Rajiv_MS_ABS.pdf: 8774 bytes, checksum: ae4f619491f3fe75dbdc9eeaf69df521 (MD5) license.txt: 4813 bytes, checksum: 715c4321821a960fa1a1e91d2ac7ebce (MD5) Previous issue date: 2000
Degree
thesis:*- Name thesis:degree_name
- M.S. (master's)
- Level thesis:degree_level
- Thesis
- Discipline thesis:degree_discipline
- Nuclear, Plasma, and Radiological Engineering
- Year dc:date
- 2017
Author and committee
dc:creator, dc:contributor.*- Author dc:creator
-
- Ranjan, Rajiv
Subjects
dc:subject × 13Rights
dc:rights- Statement dc:rights
-
- Copyright 2000 Rajiv Ranjan
- Language dc:language
- en
Identifiers
dc:identifier.*- Handle dc:identifier
- http://hdl.handle.net/2142/96508
- OAI identifier oai:identifier
- oai:www.ideals.illinois.edu:2142/96508