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University of Illinois - Urbana-Champaign
Void and Helium Bubble Stability in Amorphous Silicon Subjected to Heavy Ion Irradiation
Abstract
dc:descriptionMade available in DSpace on 2017-07-06T18:55:41Z (GMT). No. of bitstreams: 3 Okuniewski_Maria_A_MS.pdf: 82892848 bytes, checksum: 0e8165f7f8e7b43f30278739ac8c88a1 (MD5) Okuniewski_Maria_A_MS_ABS.pdf: 1807599 bytes, checksum: 56e56e0bdcdb4af9e49619bba6b03555 (MD5) license.txt: 4813 bytes, checksum: 715c4321821a960fa1a1e91d2ac7ebce (MD5) Previous issue date: 2004
Degree
thesis:*- Name thesis:degree_name
- M.S. (master's)
- Level thesis:degree_level
- Thesis
- Discipline thesis:degree_discipline
- Nuclear, Plasma, and Radiological Engineering
- Year dc:date
- 2017
Author and committee
dc:creator, dc:contributor.*- Author dc:creator
-
- Okuniewski, Maria A.
Subjects
dc:subject × 6Rights
dc:rights- Statement dc:rights
-
- Copyright Jeffrey E. Norman 2002
- Language dc:language
- en
Identifiers
dc:identifier.*- Handle dc:identifier
- http://hdl.handle.net/2142/96477
- OAI identifier oai:identifier
- oai:www.ideals.illinois.edu:2142/96477