Debris Reduction by Means of a Secondary Plasma System With a Dense Plasma Focus Extreme Ultraviolet Light Source

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Name thesis:degree_name

M.S. (master's)

Level thesis:degree_level

Thesis

Discipline thesis:degree_discipline

Nuclear, Plasma, and Radiological Engineering

Year dc:date

2017

Author dc:creator

• Jaworski, Michael A.

• nuclear engineering
• debris reduction
• secondary plasma system
• dense plasma focus
• ultraviolet light source
• miniaturization
• semiconductor devices
• light sources
• wavelengths
• ultraviolet light

Statement dc:rights

• Copyright 2006 Michael Andrew Jaworski

Language dc:language

en

Handle dc:identifier

http://hdl.handle.net/2142/96392

OAI identifier oai:identifier

oai:www.ideals.illinois.edu:2142/96392