Molecular Beam Epitaxy: A Thermomechanical Treatment

We perform a linear stability analysis, and consider the dependence of the growth rate of instability on the wave number. This dispersion relation is a function of many parameters that describe the elasticity and chemistry of the film and substrate. The analysis permits us to recover the classical results for Asaro-Tiller-Grinfeld instability, as well as more recent achievements predicting compositional segregation. Finally, we investigate the response of the instability towards a new chemical parameter (ratio of chemical energies of the species), and show that, under certain conditions, the instability behavior is determined by this parameter.

Name thesis:degree_name

Ph.D.

Level thesis:degree_level

Dissertation

Discipline thesis:degree_discipline

Theoretical and Applied Mechanics

Grantor

University of Illinois at Urbana-Champaign

Year dc:date

2015

Author dc:creator

• Korchagin, Vladimir A.

Contributors dc:contributor

• Eliot Fried

• Engineering, Materials Science

Language dc:language

eng

Identifier

(MiAaPQ)AAI3153355

OAI identifier oai:identifier

oai:www.ideals.illinois.edu:2142/87723