Low-Energy Ion-Induced Angularly-Resolved Sputtering Measurements

The phenomenon of ion-induced sputtering is integral to many applications. In magnetically confined fusion this sputtering is important for both the lifetime of plasma facing components as well as contamination of the plasma. In plasma processing the sputtering process is involved in etching directly, and deposition through the sputtering of target materials. An apparatus and method have been created and demonstrated to obtain both the angular distribution and total sputtering yield. Total yield is determined by collecting the sputtered material on a quartz crystal microbalance. The sputtered material is also collected on a pyrolytic graphite witness plate. By mapping the concentrations of the sputtered material on this plate, both polar and azimuthal angular distributions can be determined. Utilizing this setup, data has been obtained for the systems of D+ (10-700 eV) on Be at a 45 degree angle of incidence, and Ar+ (200-500 eV) on Al at normal incidence. The data obtained for D+ on Be is some of the first to become available especially at the lower energies. The Al samples although polycrystalline, had grain preferences of (100) and (110). The Al (100) sample in particular shows enhanced sputtering along the $\langle$110$\rangle$ direction at all energies. Once these effects are characterized, controlling their crystallographic orientation can enhance the performance of these sputtering targets.

Name thesis:degree_name

Ph.D.

Level thesis:degree_level

Dissertation

Discipline thesis:degree_discipline

Nuclear Engineering

Grantor

University of Illinois at Urbana-Champaign

Year dc:date

2015

Author dc:creator

• Smith, Preston Craig

Contributors dc:contributor

• Ruzic, David N.

• Engineering, Materials Science

Language dc:language

eng

Identifier

(MiAaPQ)AAI9737256

OAI identifier oai:identifier

oai:www.ideals.illinois.edu:2142/85932