Soft Lithographic Patterning on Silicon

A methodology for controlling the nanoscale architecture of etched silicon was developed though the printing of mixed monolayers. Contact printing of mixed solutions of different mole fractions of DTS and octyltrichlorosilane (OCTY) were formed monolayers on Si. Once annealed in air, these films were placed into KOH etching solutions and the resulting grain structures were examined via AFM. The data showed that different mole fractions created different grain structures after exposure to the etching solution. Additionally, the resulting etch structures were tested for photoluminescence, though only weak PL was found.

Name thesis:degree_name

Ph.D.

Level thesis:degree_level

Dissertation

Discipline thesis:degree_discipline

Chemistry

Grantor

University of Illinois at Urbana-Champaign

Year dc:date

2015

Author dc:creator

• Finnie, Krista Renee

Contributors dc:contributor

• Nuzzo, Ralph G.

• Chemistry, Inorganic

Language dc:language

eng

Identifier

(MiAaPQ)AAI9989994

OAI identifier oai:identifier

oai:www.ideals.illinois.edu:2142/84480