Length-Scale Effects on Nano-Scale Materials Behavior

For the first time, we have performed in-situ, quantitative tests on 100 nm thick aluminum films in TEM. We also have performed tensile (both low and high temperature) and bending tests on 30--485 nm thick aluminum and 75--350 nm thick gold specimens. Followings are the observations of this study. (1) The Young's modulus of aluminum deviates from the bulk values for average grain size below 50 nm (70 nm for Gold). For the first time, we observe strong non-linear elastic behavior for grain sizes below 20 nm. (2) Texture and anelastic effects cannot explain the elastic behavior at the nano-scale and we propose a mechanism based atomic-scale interactions. (3) In-situ TEM tests show that below a transitional length-scale (50 nm grain size for aluminum), dislocations cease to exist in the grain interiors. Absence of both dislocation and diffusion-based deformation mechanisms, and the increasing influence of the native oxide give rise to the resemblance to the reverse Hall-Petch behavior. (4) For the first time, we observe absence of permanent strain hardening in aluminum for grain sizes below 50 nm. We propose that this is due to the absence of dislocations at interior of grains at this length-scale. (5) For the first time, we observe grain size dependence of the strain gradient plasticity in aluminum. For grain sizes below 50 nm, the absence of dislocations results in no appreciable strain gradient strengthening. However, as the grain size increases, dislocations appear to dominate deformation characteristics, and strong strain gradient effects are observed. The characteristic length scale for aluminum is found to be about 4 microns.

Name thesis:degree_name

Ph.D.

Level thesis:degree_level

Dissertation

Discipline thesis:degree_discipline

Mechanical Engineering

Grantor

University of Illinois at Urbana-Champaign

Year dc:date

2015

Author dc:creator

• Haque, Md. Amanul

Contributors dc:contributor

• Muhammed Taher Abu Saif

• Engineering, Materials Science

Language dc:language

eng

Identifier

(MiAaPQ)AAI3070003

OAI identifier oai:identifier

oai:www.ideals.illinois.edu:2142/83775