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University of Illinois at Urbana-Champaign

Electrical Properties of Nitride/oxide Multilayered Thin Films

Abstract

dc:description

SASAS film did not have a smoother surface compared to SiNx films. Therefore, surface roughness was not a factor for the increased dielectric strength of the multilayered films. There were no observed dielectric strength increase for the nitride/nitride, oxide/oxide multilayered films.

Degree

thesis:*
Name thesis:degree_name
Ph.D.
Level thesis:degree_level
Dissertation
Discipline thesis:degree_discipline
Materials Science and Engineering
Grantor
University of Illinois at Urbana-Champaign
Year dc:date
2015

Author and committee

dc:creator, dc:contributor.*
Author dc:creator
  • Chung, Hyunim
Contributors dc:contributor
  • Mark Shannon

Subjects

dc:subject × 1

Rights

Language dc:language
eng

Identifiers

dc:identifier.*
Identifier
(MiAaPQ)AAI9996622
OAI identifier oai:identifier
oai:www.ideals.illinois.edu:2142/82939

Chain of custody

source
Harvested from
University of Illinois - Urbana-Champaign
Base URL
www.ideals.illinois.edu/oai-pmh
Last updated
2026-07-22
Source record
OAI-PMH GetRecord
citation

Chung, Hyunim. Electrical Properties of Nitride/oxide Multilayered Thin Films. Dissertation thesis, University of Illinois at Urbana-Champaign, 2015. http://hdl.handle.net/2142/82939