Evaporative Lithographic Patterning of Colloidal Films

Finally, fluid flow and pattern formation during evaporative lithographic patterning of non-aqueous colloidal films differ significantly from their aqueous counterparts. Evaporative cooling creates surface tension gradients that induce recirculating flows and a majority of the particles are deposited at the interface between recirculating flow cells in the non-evaporating, masked regions. Above a critical colloid volume fraction, recirculating flows are suppressed, and a majority of the particles are convected to the regions of higher evaporative flux.

Name thesis:degree_name

Ph.D.

Level thesis:degree_level

Dissertation

Discipline thesis:degree_discipline

Materials Science and Engineering

Grantor

University of Illinois at Urbana-Champaign

Year dc:date

2015

Author dc:creator

• Harris, Daniel James

Contributors dc:contributor

• Lewis, Jennifer A.

• Engineering, Materials Science

Language dc:language

eng

Identifier

(MiAaPQ)AAI3314787

OAI identifier oai:identifier

oai:www.ideals.illinois.edu:2142/82818