Multiscale Approaches for Simulation of Nucleation, Growth, and Additive Chemistry During Electrochemical Deposition of Thin Metal Films

A two-step approach was used to calculate the spatial distribution of nucleation events on an electrode undergoing deposition by electrolysis under the influence of mass transport. The simulations were carried out by first, calculating the time-dependent concentration profiles in the vicinity of a hemispherical nucleus, then using the concentration profiles as boundary conditions for a surface simulation that relied on the island dynamics algorithm. The model additive system was found to uniformize the distribution of nuclei on the simulated surface, leading to a significant reduction in the size of nucleation exclusion zones.

Name thesis:degree_name

Ph.D.

Level thesis:degree_level

Dissertation

Discipline thesis:degree_discipline

Chemical Engineering

Grantor

University of Illinois at Urbana-Champaign

Year dc:date

2015

Author dc:creator

• Stephens, Ryan Mark

Contributors dc:contributor

• Alkire, Richard C.

• Engineering, Materials Science

Language dc:language

eng

Identifier

(MiAaPQ)AAI3337829

OAI identifier oai:identifier

oai:www.ideals.illinois.edu:2142/82412