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University of Illinois at Urbana-Champaign

Multiscale Simulation and Optimization of Copper Electrodeposition

Abstract

dc:description

Two parallel KMC algorithms were also developed for the simulation of electrochemical nucleation and growth. Compared to the regular serial KMC algorithm, the developed parallel algorithms are able to speedup simulations and study large systems which may not be addressed by a single processor due to memory limitations.

Degree

thesis:*
Name thesis:degree_name
Ph.D.
Level thesis:degree_level
Dissertation
Discipline thesis:degree_discipline
Chemical Engineering
Grantor
University of Illinois at Urbana-Champaign
Year dc:date
2015

Author and committee

dc:creator, dc:contributor.*
Author dc:creator
  • Li, Xiaohai
Contributors dc:contributor
  • Braatz, Richard D.
  • Alkire, Richard C.

Subjects

dc:subject × 1

Rights

Language dc:language
eng

Identifiers

dc:identifier.*
Identifier
(MiAaPQ)AAI3290296
OAI identifier oai:identifier
oai:www.ideals.illinois.edu:2142/82396

Chain of custody

source
Harvested from
University of Illinois - Urbana-Champaign
Base URL
www.ideals.illinois.edu/oai-pmh
Last updated
2026-07-22
Source record
OAI-PMH GetRecord
citation

Li, Xiaohai. Multiscale Simulation and Optimization of Copper Electrodeposition. Dissertation thesis, University of Illinois at Urbana-Champaign, 2015. http://hdl.handle.net/2142/82396