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University of Illinois at Urbana-Champaign
Dynamics of High- and Low -Pressure Plasma Remediation
Abstract
dc:descriptionThe use of DBDs as excimer ultraviolet (UV) lighting sources was also studied. The mixture Xe/Cl2 ≈ 99/1 was found to be an optimum gas mixture for the generation of the XeCl*. Higher applied voltage improves both the intensity and efficiency of UV photon generations. The strong attachment at high Cl2 concentration (e.g., ≥5%) leads to electron shell propagation to smaller radii after the voltage pulse.
Degree
thesis:*- Name thesis:degree_name
- Ph.D.
- Level thesis:degree_level
- Dissertation
- Discipline thesis:degree_discipline
- Electrical Engineering
- Grantor
- University of Illinois at Urbana-Champaign
- Year dc:date
- 2015
Author and committee
dc:creator, dc:contributor.*- Author dc:creator
-
- Xu, Xudong
- Contributors dc:contributor
-
- Kushner, Mark J.
Subjects
dc:subject × 1Rights
- Language dc:language
- eng
Identifiers
dc:identifier.*- Identifier
- (MiAaPQ)AAI9955683
- OAI identifier oai:identifier
- oai:www.ideals.illinois.edu:2142/81327