University of Illinois at Urbana-Champaign
Hydrogen gas generation by water vapor dissociation in an Al/Al2O3 microchannel plasma device
Abstract
dc:descriptionAn aluminum/alumina (Al/Al2O3) microchannel plasma reactor is used to generate H2 with an energy efficiency of 2.5 % by dissociating water vapor in Ar at atmospheric pressure and room temperature. The value compares favorably to other plasma reactors reported in the literature, having reported energy efficiencies ≤ 2 %. Additionally, spectra of the Hα line are used to calculate electron densities, which are in the vicinity of 1.5 ± 0.2 × 1016 cm-3, while spectra of the OH(A-X) transition show a distinctly non-equilibrium population distribution in the OH(A2Σ+) state. Al/Al2O3 microchannel plasma device was shown to be efficient in water dissociation as compared with other plasma reactors recently reported in the literature.
Degree
thesis:*- Name thesis:degree_name
- M.S.
- Level thesis:degree_level
- Thesis
- Discipline thesis:degree_discipline
- Electrical & Computer Engr
- Grantor
- University of Illinois at Urbana-Champaign
- Year dc:date
- 2015
Author and committee
dc:creator, dc:contributor.*- Author dc:creator
-
- Dai, Zhen
Subjects
dc:subject × 4Rights
dc:rights- Statement dc:rights
-
- Copyright 2015 Zhen Dai
- Language dc:language
- en
Identifiers
dc:identifier.*- Handle dc:identifier
- http://hdl.handle.net/2142/78544
- OAI identifier oai:identifier
- oai:www.ideals.illinois.edu:2142/78544