Back to results

University of Illinois at Urbana-Champaign

Hydrogen gas generation by water vapor dissociation in an Al/Al2O3 microchannel plasma device

Abstract

dc:description

An aluminum/alumina (Al/Al2O3) microchannel plasma reactor is used to generate H2 with an energy efficiency of 2.5 % by dissociating water vapor in Ar at atmospheric pressure and room temperature. The value compares favorably to other plasma reactors reported in the literature, having reported energy efficiencies ≤ 2 %. Additionally, spectra of the Hα line are used to calculate electron densities, which are in the vicinity of 1.5 ± 0.2 × 1016 cm-3, while spectra of the OH(A-X) transition show a distinctly non-equilibrium population distribution in the OH(A2Σ+) state. Al/Al2O3 microchannel plasma device was shown to be efficient in water dissociation as compared with other plasma reactors recently reported in the literature.

Degree

thesis:*
Name thesis:degree_name
M.S.
Level thesis:degree_level
Thesis
Discipline thesis:degree_discipline
Electrical & Computer Engr
Grantor
University of Illinois at Urbana-Champaign
Year dc:date
2015

Author and committee

dc:creator, dc:contributor.*
Author dc:creator
  • Dai, Zhen

Subjects

dc:subject × 4

Rights

dc:rights
Statement dc:rights
  • Copyright 2015 Zhen Dai
Language dc:language
en

Identifiers

dc:identifier.*
Handle dc:identifier
http://hdl.handle.net/2142/78544
OAI identifier oai:identifier
oai:www.ideals.illinois.edu:2142/78544

Chain of custody

source
Harvested from
University of Illinois - Urbana-Champaign
Base URL
www.ideals.illinois.edu/oai-pmh
Last updated
2026-07-22
Source record
OAI-PMH GetRecord
citation

Dai, Zhen. Hydrogen gas generation by water vapor dissociation in an Al/Al2O3 microchannel plasma device. Thesis thesis, University of Illinois at Urbana-Champaign, 2015. http://hdl.handle.net/2142/78544