A Study of Amorphous Hydrogenated Titanium-Carbide Films: Structure, Stability, and Role of Hydrogen Doping

Amorphous hydrogenated titanium carbide films (a-TiC(,x):H(,y), 0.88 < x < 0.95 and 0.05 < y < 0.12) were successfully prepared by low-temperature (150-300(DEGREES)C) and low-pressure (<10('-5) torr) metallorganic chemical vapor deposition (MOCVD) of the organometallic compound tetraneopentyl-titanium. X-ray and electron diffraction studies confirmed the amorphicity of the coatings, while controlled-heating experiments emphasized their stability against crystallization to higher temperatures ((TURN)1100(DEGREES)C) than typical glassy metals. Analyses of the coatings by Auger electron spectroscopy (AES), electron energy-loss spectroscopy (EELS), and x-ray photoelectron spectroscopy (XPS) led to an understanding of the film morphology and microchemistry, and to a quantitation of H concentrations in the coatings. This work necessitated, in a preliminary stage, performing MOCVD of the Ti-coordination compound titanium-bipyridine and completing the characterization studies started by Morancho and Constant on the corresponding deposited films.

Name thesis:degree_name

Ph.D.

Level thesis:degree_level

Dissertation

Discipline thesis:degree_discipline

Physics

Grantor

University of Illinois at Urbana-Champaign

Date dc:date

10000-01-01

Author dc:creator

• Kaloyeros, Alain E.

• Physics, Condensed Matter

Language dc:language

eng

Identifier

(UMI)AAI8711818

OAI identifier oai:identifier

oai:www.ideals.illinois.edu:2142/77402