Surface Patterning, Electronic Device Fabrication And, Three-Dimensional Self-Assembly Using Polydimethylsiloxane

A masterless decal transfer lithography technique is herein described for pattering with polydimethylsiloxane (PDMS). This procedure uses a novel ultraviolet zone (UVO) exposure mask, which allows for the photopatterning of UVO modifications of PDMS surfaces. This modification enables the direct photoinitiated patterning of discrete PDMS patterns without the use of a master. The UVO activated PDMS regions are chemically bonded to oxide bearing surfaces with a greater strength than the modulus of the PDMS and mechanically tear into the bulk, generating a surface with triangular relief features. The capabilities and limitations of this technique are investigated. Applications utilizing this technique are subsequently explored and prove to can be useful for generating cone structures to direct neuronal cell growth as well as for generating phase shifting masks with triangular profiles.

Name thesis:degree_name

Ph.D.

Level thesis:degree_level

Dissertation

Discipline thesis:degree_discipline

Chemistry

Grantor

University of Illinois at Urbana-Champaign

Year dc:date

2014

Author dc:creator

• Motala, Michael Jonathan

Contributors dc:contributor

• Nuzzo, Ralph G.

• Chemistry, Inorganic

Identifier

(UMI)AAI3399023

OAI identifier oai:identifier

oai:www.ideals.illinois.edu:2142/72261