Filament-Assisted Chemical Vapor Deposition of Diamond and Its Mechanism

Diamond films were deposited on various substrates by filament-assisted chemical vapor deposition (FACVD). Different experimental conditions were employed to determine the effects of parameters such as filament temperature, methane concentration in the starting gas, and substrate temperature on diamond growth. The deposited films were characterized by techniques such as Raman spectroscopy, X-ray diffraction (XRD), Auger electron spectroscopy (AES), and scanning electron microscopy (SEM).

Name thesis:degree_name

Ph.D.

Level thesis:degree_level

Dissertation

Discipline thesis:degree_discipline

Ceramics Engineering

Grantor

University of Illinois at Urbana-Champaign

Year dc:date

2014

Author dc:creator

• Chen, Zhong-Jia

Contributors dc:contributor

• Brown, Sherman D.,

• Engineering, Chemical
• Engineering, Materials Science

Identifier

(UMI)AAI9328997

OAI identifier oai:identifier

oai:www.ideals.illinois.edu:2142/72170