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University of Illinois at Urbana-Champaign

Semiconductor Laser Arrays Grown by Metalorganic Chemical Vapor Deposition

Abstract

dc:description

The metalorganic chemical vapor deposition system (MOCVD) allows for the growth of ultrathin epitaxial layers of III-V semiconductor compounds. This vapor deposition process is well suited for the growth of high performance semiconductor laser structures. Experimental data have been collected on a variety of MOCVD grown laser structures and are presented along with device design criteria.

Degree

thesis:*
Name thesis:degree_name
Ph.D.
Level thesis:degree_level
Dissertation
Discipline thesis:degree_discipline
Electrical Engineering
Grantor
University of Illinois at Urbana-Champaign
Year dc:date
2014

Author and committee

dc:creator, dc:contributor.*
Author dc:creator
  • Mawst, Luke

Subjects

dc:subject × 1

Identifiers

dc:identifier.*
Identifier
(UMI)AAI8711834
OAI identifier oai:identifier
oai:www.ideals.illinois.edu:2142/69354

Chain of custody

source
Harvested from
University of Illinois - Urbana-Champaign
Base URL
www.ideals.illinois.edu/oai-pmh
Last updated
2026-07-22
Source record
OAI-PMH GetRecord
citation

Mawst, Luke. Semiconductor Laser Arrays Grown by Metalorganic Chemical Vapor Deposition. Dissertation thesis, University of Illinois at Urbana-Champaign, 2014. http://hdl.handle.net/2142/69354