Deposition of aluminum oxide by evaporative coating at atmospheric pressure (ECAP)

Aluminum oxide is one of the most important ceramic oxides and has a wide range of uses, including high-temperature applications and microelectronics. Recently, the Center for Plasma-Material Interaction (CPMI) has developed innovative coating method of Evaporative Coating at Atmospheric Pressure (ECAP). This new idea is an atmospheric-pressure based process. By using the thermal energy of plasma, solid aluminum are evaporated and then produce a PVD-like alumina coating on a work piece. The aluminum rod is inserted in the center of the microwave torch feeding a melt pool and evaporates into the surrounding plasma plume. It can be deposits as Al2O3 if done in an oxygen environment or as AlN with nitrogen. A gas shield keeps the working gas pure. Following the same concept as the Laser Assisted Plasma Coating at Atmospheric Pressure (LAPCAP), the material captured by the plasma plume is atomic in nature (the evaporated metal atom) and should therefore end up deposited molecule-by-molecule as in a PVD fashion. A much higher thermal energy of the plasma plume will make a superior coating microstructure as compared to a purely evaporated film. On the contrary, aluminum evaporated in an oxygen environment will merely makes alumina dust.

Name thesis:degree_name

M.S.

Level thesis:degree_level

Thesis

Discipline thesis:degree_discipline

Nuclear, Plasma, Radiolgc Engr

Grantor

University of Illinois at Urbana-Champaign

Year dc:date

2013

Author dc:creator

• Wu, Yuilun

Contributors dc:contributor

• Ruzic, David N.

• Aluminum Oxide
• Atmospheric Pressure
• Plasma
• Evaporative Coating
• Evaporative Coating of Atmospheric Pressure (ECAP)
• microwave
• plasma jet

Statement dc:rights

• Copyright 2013 Yuilun Wu

Language dc:language

en

Handle dc:identifier

http://hdl.handle.net/2142/44104

OAI identifier oai:identifier

oai:www.ideals.illinois.edu:2142/44104