University of Illinois at Urbana-Champaign
Chemical sputtering studies of lithiated ATJ graphite
Abstract
dc:descriptionPlasma Facing Component (PFC) materials are crucial to fusion reactor development. There is no one material that functions as an ideal PFC material. As a result, coatings are applied to control the interaction between plasmas and the PFC material. Lithium wall conditioning treatments in the National Spherical Torus Experiment have shown dramatic improvements in plasma performance. In order to understand the complex system of lithiated ATJ graphite, chemical sputtering measurements of plain and lithiated ATJ graphite have been conducted in IIAX (Ion-surface InterAction eXperiment) facility. Chemical sputtering of graphite is dependent on the ion energy and substrate temperature, hence the total effects of treating ATJ graphite with lithium in hydrogen plasma are investigated in terms of different target temperatures and bias voltages. The dominant chemical sputtering product is Methane (CH4). It was found that lithium treatments have suppressed the chemical sputtering of ATJ graphite. The suppression of chemical sputtering effect as function of varying lithium thickness on ATJ graphite has been thoroughly studied. The experimental data suggests that the thickness of the lithium has to be greater than the surface roughness of the ATJ graphite to see substantial suppression in chemical sputtering.
Degree
thesis:*- Name thesis:degree_name
- M.S.
- Level thesis:degree_level
- Thesis
- Discipline thesis:degree_discipline
- Nuclear, Plasma, Radiolgc Engr
- Grantor
- University of Illinois at Urbana-Champaign
- Year dc:date
- 2013
Author and committee
dc:creator, dc:contributor.*- Author dc:creator
-
- Raman, Priya
- Contributors dc:contributor
-
- Ruzic, David N.
Subjects
dc:subject × 4Rights
dc:rights- Statement dc:rights
-
- Copyright 2012 Priya Raman
- Language dc:language
- en
Identifiers
dc:identifier.*- Handle dc:identifier
- http://hdl.handle.net/2142/42432
- OAI identifier oai:identifier
- oai:www.ideals.illinois.edu:2142/42432