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University of Illinois - Urbana-Champaign

Oxide charge traps and interface states at the silicon-silicon dioxide interface

Abstract

dc:description

Meta1-oxide-semiconductor capacitors were fabricated with 2800 A thick dry grown thermal oxides under various conditions to determine the effects of oxidation parameters on oxide charge trapping. Electrons and holes were injected into the oxides by the VUV-bias method. In this method, electron-hole pairs are created at the gate-Si0interface by 2 irradiation with vacuum ultraviolet light of 10.2 eV photon energy. Electrons or holes are injected by applying the appropriate voltage to the gate. The charge trapped at the interface was measured by the capacitance-voltage method and located by the photocurrent-voltage method. The trapped charge was found to be within 100 A of the interface. Trapping kinetics data revealed neutral, donor-like, hole traps with capture cross sections of 6xlO-14cm2 and lxlO-15cm2. In addition, an acceptor-like electron trap with a capture cross section of lxlO-15cm2 was detected in three devices. These traps, after being positively charged by hole capture were efficient electron traps with a capture cross section of 3xlO-13cm2 • Little increase in interface states was observed as a result of trap charging. The annealing behavior of the oxide traps support the model that equates trivalent silicon with the trap with the larger hole capture cross section and non-bridging oxygen with the trap with the smaller hole capture cross section. An analysis of the annealing kinetics is given.

Degree

thesis:*
Name thesis:degree_name
Ph.D.
Level thesis:degree_level
Dissertation
Discipline thesis:degree_discipline
Physics
Year dc:date
2011

Author and committee

dc:creator, dc:contributor.*
Author dc:creator
  • Stivers, Alan Randolph
Contributors dc:contributor
  • Sah, C.T.

Subjects

dc:subject × 6

Rights

dc:rights
Statement dc:rights
  • 1979 Alan Randolph Stivers
Language dc:language
en

Identifiers

dc:identifier.*
Identifier
409214
OAI identifier oai:identifier
oai:www.ideals.illinois.edu:2142/25528

Chain of custody

source
Harvested from
University of Illinois - Urbana-Champaign
Base URL
www.ideals.illinois.edu/oai-pmh
Last updated
2026-07-22
Source record
OAI-PMH GetRecord
citation

Stivers, Alan Randolph. Oxide charge traps and interface states at the silicon-silicon dioxide interface. Dissertation thesis, 2011. http://hdl.handle.net/2142/25528