Nanocrystalline copper-tantalum composites

This research investigated the physical metallurgy, high temperatures coarsening, and processing/structure relationships for Cu$\sb{\rm 1-x}$Ta$\sb{\rm x}$ (x = $\sim$5 to 20 atomic percent) alloys. These metastable alloys were produced using a plasma assisted physical vapor deposition (PAPVD) process which allowed ion bombardment during alloy deposition. Techniques used for structural and chemical analyses of these alloys include: transmission and scanning electron microscopy, energy dispersive x-ray analysis, x-ray diffraction, microhardness, and sheet resistance. PAPVD processing parameters varied in this study included: ion bombardment, ion to depositing atom ratio, deposition rate, and alloy composition. Thermal processing variations included: annealing at 800 C for up to 100 hours and at 900 C for up to 10 hours and hot isostatic pressing (HIP) at 900 C for 1 hour and 172 MPa.

Name thesis:degree_name

Ph.D.

Level thesis:degree_level

Dissertation

Discipline thesis:degree_discipline

Physics, General

Grantor

University of Illinois at Urbana-Champaign

Year dc:date

2011

Author dc:creator

• Savage, Howard Scott

Contributors dc:contributor

• Rigsbee, J. Michael

• Physics, General
• Engineering, Metallurgy
• Engineering, Materials Science

Statement dc:rights

• Copyright 1991 Savage, Howard Scott

Language dc:language

eng

Identifier

AAI9136723
(UMI)AAI9136723

OAI identifier oai:identifier

oai:www.ideals.illinois.edu:2142/23694