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University of Illinois at Urbana-Champaign

High-purity epitaxial growth and characterization of III-V compound semiconductors

Abstract

dc:description

The growth and characterization of epitaxial indium gallium arsenide phosphide compound semiconductor films are described. Methods have been developed to improve the purity of both InP and GaAs and to better assess the crystalline homogeneity of the InGaAsP alloy system.

Degree

thesis:*
Name thesis:degree_name
Ph.D.
Level thesis:degree_level
Dissertation
Discipline thesis:degree_discipline
Electrical and Computer Engineering
Grantor
University of Illinois at Urbana-Champaign
Year dc:date
2011

Author and committee

dc:creator, dc:contributor.*
Author dc:creator
  • Roth, Thomas John
Contributors dc:contributor
  • Stillman, Gregory E.

Subjects

dc:subject × 3

Rights

dc:rights
Statement dc:rights
  • Copyright 1989 Roth, Thomas John
Language dc:language
eng

Identifiers

dc:identifier.*
Identifier
AAI9011002
(UMI)AAI9011002
OAI identifier oai:identifier
oai:www.ideals.illinois.edu:2142/22720

Chain of custody

source
Harvested from
University of Illinois - Urbana-Champaign
Base URL
www.ideals.illinois.edu/oai-pmh
Last updated
2026-07-22
Source record
OAI-PMH GetRecord
citation

Roth, Thomas John. High-purity epitaxial growth and characterization of III-V compound semiconductors. Dissertation thesis, University of Illinois at Urbana-Champaign, 2011. http://hdl.handle.net/2142/22720