Role of low-energy ion/surface interactions in controlling microstructure and texture evolution during film growth

The effects on microstructure and microchemistry of ion irradiation during AlCu film growth on a-SiO$\sb2$ by two directional sputtering techniques--collimated magnetron sputter deposition (CMSD) and ionized magnetron sputter deposition (IMSD)--were investigated. Both sets of films have dense columnar microstructures with (111) preferred orientation (PO). IMSD layers exhibited competitive column growth showing an order of magnitude higher degree of (111) orientation with much smaller azimuthal spread. The IMSD films were tensile while the CMSD films were slightly compressive.

Name thesis:degree_name

Ph.D.

Level thesis:degree_level

Dissertation

Discipline thesis:degree_discipline

Materials Science and Engineering

Grantor

University of Illinois at Urbana-Champaign

Year dc:date

2011

Author dc:creator

• Kim, Young-Woon

Contributors dc:contributor

• Greene, Joseph E.

• Engineering, Metallurgy
• Engineering, Materials Science

Statement dc:rights

• Copyright 1995 Kim, Young-Woon

Language dc:language

eng

Identifier

AAI9624394
(UMI)AAI9624394

OAI identifier oai:identifier

oai:www.ideals.illinois.edu:2142/22226