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University of Illinois at Urbana-Champaign

Transition metal allyls and hydrides as chemical vapor deposition precursors

Abstract

dc:description

Thin films of high purity palladium can be prepared at low temperature (250$\sp\circ$C) metal-organic chemical vapor deposition of bis(allyl)palladium or (cyclopentadienyl)(allyl)palladium.

Degree

thesis:*
Name thesis:degree_name
Ph.D.
Level thesis:degree_level
Dissertation
Discipline thesis:degree_discipline
Chemistry
Grantor
University of Illinois at Urbana-Champaign
Year dc:date
2011

Author and committee

dc:creator, dc:contributor.*
Author dc:creator
  • Gozum, John Ekrem

Subjects

dc:subject × 3

Rights

dc:rights
Statement dc:rights
  • Copyright 1991 Gozum, John Ekrem
Language dc:language
eng

Identifiers

dc:identifier.*
Identifier
AAI9136603
(UMI)AAI9136603
OAI identifier oai:identifier
oai:www.ideals.illinois.edu:2142/21979

Chain of custody

source
Harvested from
University of Illinois - Urbana-Champaign
Base URL
www.ideals.illinois.edu/oai-pmh
Last updated
2026-07-22
Source record
OAI-PMH GetRecord
citation

Gozum, John Ekrem. Transition metal allyls and hydrides as chemical vapor deposition precursors. Dissertation thesis, University of Illinois at Urbana-Champaign, 2011. http://hdl.handle.net/2142/21979