Back to results
University of Illinois at Urbana-Champaign
Modeling of generation and transport of particles in low pressure glow discharges and contamination of wafers
Abstract
dc:descriptionLarge particles (tens of nm to tens of μm in diameter) are problematic in low pressure ($<$1 Torr) plasma processing (etching, deposition) discharges because they can contaminate the product and can perturb electron transport. The role of negative ions in the formation of large clusters, the precursors to particles, in low pressure plasmas is theoretically investigated. We find that the formation of particles requires a critically large cluster. We propose that negatively charged intermediates, which are trapped in electropositive plasmas, increase the average residence time of clusters to allow the growth of critically large clusters.
Degree
thesis:*- Name thesis:degree_name
- Ph.D.
- Level thesis:degree_level
- Dissertation
- Discipline thesis:degree_discipline
- Electrical Engineering
- Grantor
- University of Illinois at Urbana-Champaign
- Year dc:date
- 2011
Author and committee
dc:creator, dc:contributor.*- Author dc:creator
-
- Choi, Seung Jin
- Contributors dc:contributor
-
- Kushner, Mark J.
Subjects
dc:subject × 3Rights
dc:rights- Statement dc:rights
-
- Copyright 1993 Choi, Seung Jin
- Language dc:language
- eng
Identifiers
dc:identifier.*- Identifier
-
AAI9411590
(UMI)AAI9411590 - OAI identifier oai:identifier
- oai:www.ideals.illinois.edu:2142/20486