Plasma-assisted deposition of chromium, fluorocarbon and chromium/carbon/fluorine films on glass, polymer and metal substrates

Sputter deposition of chromium (Cr), plasma polymerization of hexafluoroethane (C$\sb2$F$\sb6$), and plasma-assisted deposition of chromium/carbon/fluorine (Cr/C/F) thin films onto glass, polytetrafluoroethylene (PTFE), and low carbon, cold rolled steel substrates has been studied. Depositions were conducted in an internal electrode, radio frequency sputter deposition system at 100 W of power for one hour. Argon and C$\sb2$F$\sb6$ gases were used as the glow discharge media and characterization of the plasmas was done by optical emission spectroscopy. Fabrication of unique non-body centered cubic (non-BCC) Cr, plasma polymerized fluorocarbon, and optically transparent Cr/C/F thin films were done by non-equilibrium plasma processing.

Name thesis:degree_name

Ph.D.

Level thesis:degree_level

Dissertation

Discipline thesis:degree_discipline

Materials Science and Engineering

Grantor

University of Illinois at Urbana-Champaign

Year dc:date

2011

Author dc:creator

• O'Keefe, Matthew J.

Contributors dc:contributor

• Rigsbee, J. Michael

• Engineering, Metallurgy
• Engineering, Materials Science

Statement dc:rights

• Copyright 1993 O'Keefe, Matthew J.

Language dc:language

eng

Identifier

AAI9411737
(UMI)AAI9411737

OAI identifier oai:identifier

oai:www.ideals.illinois.edu:2142/19954