Surface decomposition studies of trimethylgallium on silicon(100)

The trimethylgallium/silicon system is fundamentally and industrially important in microelectronics processing. In this study, the decomposition of trimethylgallium (TMG) on silicon (100) was investigated using thermal desorption spectroscopy (TDS), x-ray photoelectron spectroscopy (XPS), infrared spectroscopy (IR), and electron energy loss spectroscopy (EELS).

Name thesis:degree_name

Ph.D.

Level thesis:degree_level

Dissertation

Discipline thesis:degree_discipline

Chemical and Biomolecular Engineering

Grantor

University of Illinois at Urbana-Champaign

Year dc:date

2011

Author dc:creator

• Lee, Fourmun

Contributors dc:contributor

• Masel, Richard I.

• Engineering, Chemical
• Engineering, Electronics and Electrical
• Engineering, Materials Science

Statement dc:rights

• Copyright 1989 Lee, Fourmun

Language dc:language

eng

Identifier

AAI8924879
(UMI)AAI8924879

OAI identifier oai:identifier

oai:www.ideals.illinois.edu:2142/19156